Company Dynamic | Stanford Advanced Materials

September 28, 2019Julissa GreenBlog, Sputtering Target0

Do You Know What The Anelva Target Is?

Anelva target, I believe, is a very unfamiliar phrase for most people. And maybe that’s the reason why you are here, reading this article. Actually, with a simple explanation–Anelva target is also known as the target used in the semiconductor industry, you will immediately get its meaning. In today’s semiconductor manufacturing processes, sputtering targets are...

September 23, 2019Julissa GreenBlog, Case Study, Sputtering Technology, Targets Industry News0

Effect of Silver Additives on the Conductivity of Indium Tin Oxide Sputtered Films

Transparent conductive films have many applications, and indium tin oxide films have received great attention in the glass manufacturing industry due to their excellent properties. However, the manufacturing process of the indium tin oxide film requires a higher temperature, which limits its application. In order to reduce this temperature, various “sintering agents” have been taken...

September 19, 2019Julissa GreenBlog, Most Popular, PVD, Target Application0

Table Comparison: Physical Vapor Deposition Vs. Chemical Vapor Deposition

Physical vapor deposition (PVD) and chemical vapor deposition (CVD) are considered to be the most attractive surface coating technologies and have a wide range of applications in various industries. Let us compare these two methods in detail. Physical Vapor Deposition Chemical Vapor Deposition Definition Physical vapor deposition (PVD) is a series of vacuum deposition methods...

September 15, 2019Julissa GreenBlog, Most Popular, Sputtering Target, Target Application0

Platinum vs. Gold: Which Material Is Better for Rings?

As for the two most commonly used metals for engagement and wedding rings, platinum and gold, most people distinguish them by their different colors-platinum is naturally white, and gold is naturally yellow. However, rings made of white gold (composed of gold, alloys, and a rhodium plating) have a similar white color to platinum rings. Since...

August 27, 2019Julissa GreenBlog, Cornerstone, Sputtering Target0

An Overview of Tantalum Element

Tantalum Overview The texture of the tantalum is very hard and the hardness can reach 6-6.5. Its melting point is as high as 2996 °C, only after carbon, tungsten, rhenium, and osmium. Tantalum is malleable and can be drawn into a thin foil. Its coefficient of thermal expansion is very small, and it only expands by 6.6 parts...

August 27, 2019Julissa GreenBlog, PVD, Sputtering Target, Sputtering Technology0

Sputter Coating Technologies: Direct Current Sputtering (DC Sputtering)

We have previously made a brief introduction of Five Sputter Coating Technologies, including unbalanced magnetron sputtering, radio frequency sputtering (RF sputtering), direct current magnetron sputtering (DC sputtering), mid-frequency alternating current magnetron sputtering (AC sputtering), and reactive magnetron sputtering. In this article, we are going to talk about direct current (DC) sputtering in detail. To begin...

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