Company Dynamic | Stanford Advanced Materials

April 16, 2019Julissa GreenBlog, Case Study, Evaporation Materials0

Case Study: Silver Evaporation Material Deposition on Glass Surface

The case A well-known industrial glass company—-We attempted to deposit a silver film about one micron thick on the glass substrate using silver evaporation materials by vacuum evaporation. And our existing coating facilities are limited that we can only use electron beam evaporation. We tried Ag / Ti glass in the beginning, but the silver...

April 9, 2019Julissa GreenBlog, PVD, Sputtering Target, Target Application0

Applications of Sputtering Target for Physical Vapor Deposition

The sputtering target is an important material for physical vapor deposition, the most widely used technology for depositing materials. As its name suggests, “physical” means that the PVD coating method involves a purely physical process. During the physical vapor deposition, a solid target material is broken up into the vapor state (usually in a high...

April 2, 2019Julissa GreenBlog, Sputtering Target, Sputtering Technology0

3 Factors Affecting the Deposition Rate in Magnetron Sputtering

Magnetron sputtering is a physical vapor deposition method that allows the deposition of various materials, including metals, oxides, ceramics and etc. by using a specially formed magnetic field applied to a diode sputtering target. The deposition rate, or the film formation rate, is an important parameter that measures the effectiveness of the magnetron sputtering machine....

April 2, 2019Julissa GreenBlog, Evaporation Materials, Sputtering Target0

Yttrium Oxide Dielectric Film: Ideal Electronic Materials

The yttrium oxide dielectric film refers to a thin film material as a dielectric, which is an important component and ideal material of a hybrid integrated circuit used in the electronics industry. Yttrium Oxide Dielectric Film Properties Y2O3 is a white powder with a crystal structure of body-centered cubic. Yttrium Oxide Dielectric Film has good...

March 29, 2019Julissa GreenBlog, Sputtering Target, Sputtering Technology0

Advantages of Physical Vapor deposition (Over Other Material Depositions)

At present, physical vapor deposition (PVD) is a very popular coating technique in some areas, such as the watch, jewelry, car, and so on. Why are these industries so fond of PVD coatings? Let’s see the advantages of PVD coating. First of all, we have to know what physical vapor deposition is. When it comes to this...

Aluminum Scandium Sputter Target Introduction

March 27, 2019Julissa GreenBlog, Sputtering Target, Target Application0

An Introduction to Aluminum Scandium Sputtering Target

Aluminum Scandium Sputtering Target Description The aluminum scandium sputtering target is a type of film coating material made of aluminum scandium alloy. Therefore, they have similar physical and chemical characteristics. Aluminum scandium alloy is also called scandium-containing aluminum alloy. As we all know, aluminum sputtering target is used in many industries because it can deposit a cheap...

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