Company Dynamic - Global Supplier of Sputtering Targets and Evaporation Materials

October 15, 2018Sputter TargetsBlog, Sputtering Target, Targets Industry News0

Introduction to Aluminum Nitride Semiconductor

Development of Semiconductor Materials 1 The first generation of semiconductor: represented by Si, Ge semiconductor materials; 2 The second generation of semiconductor: represented by GaAs, InP semiconductor materials; 3 The third generation of semiconductor: represented by several wide-bandgap semiconductor materials such as silicon carbide (SiC), gallium nitride (GaN), zinc oxide (ZnO), diamond, and aluminum nitride...

October 11, 2018Sputter TargetsBlog, Sputtering Technology0

Things you should know about sputter coating

Almost all new sputter deposition equipment uses a powerful magnet to spiral the electrons to accelerate the ionization of the argon around the target, resulting in an increased probability of collision between the sputtering target and the argon ions, and thus the sputtering rate is increased. Generally, most metal films uses DC sputtering, while non-conductive...

October 10, 2018Sputter TargetsApplication, Blog, Metal0

What is Aluminum Scandium alloy?

What is Aluminum Scandium alloy? Aluminum Scandium alloy is a kind of high-performance aluminum alloy. There are several ways to improve the performance of aluminum alloy. In the past 20 years, micro-alloying and toughening is the frontier of high-performance aluminum alloy research. Features Adding a small amount of scandium to the aluminum alloy can promote...

October 8, 2018Sputter TargetsBlog, Metal0

How to reduce the price of titanium alloy?

Titanium alloys have been widely used in the aerospace industry. However, in recent years, although the aerospace industry is still the biggest market, the research and development direction of titanium alloys has shifted from the aerospace industry to the civilian industry. Titanium alloys applied for aerospace industry tend to have excellent performance but are EXPENSIVE....

September 28, 2018Sputter TargetsApplication, Blog, Sputtering Target0

What is Anelva Targets?

Anelva target, I believe, is a very unfamiliar phrase for most people. And maybe that’s the reason why you are here, reading this article. Actually, with a simple explanation–Anelva target is also known as target used in semiconductor industry, you will immediately get its meaning. In today’s semiconductor manufacturing processes, sputtering targets are undoubtedly the...

September 27, 2018Sputter TargetsBlog, Sputtering Target, Sputtering Technology0

Advantages and disadvantages of different preparation methods for ITO targets

Previously, we have introduced Four main molding methods for ITO targets, mainly about their definitions and characteristics. And today I think it necessary to talk about the advantages and disadvantages of each method, which is helpful for you to make choices between them when you want to prepare ITO targets. Hot Pressing The hot pressing...

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