Company Dynamic | Stanford Advanced Materials

March 21, 2023Julissa GreenBlog, Substrate, Wafer0

Gadolinium Gallium Garnet: Properties, Manufacturing & Applications

Introduction Garnets (A3B2(SiO4)3) are a group of minerals commonly used as substrates, abrasives, and gemstones. Garnets share similar physical properties and crystal structures, yet they have disparities in chemical composition. Here, this article is going to explore the garnet family in the specific case of gadolinium gallium garnet. Hope that you can have a basic...

March 14, 2023Julissa GreenBlog, Sputtering Target, Target Bonding0

What Is Indium Bonding for Sputtering Target?

Introduction to Indium Bonding Target bonding is a significant process that joins sputtering targets and backing plates together, yet improper bonding materials would lead to poor heat release, cracking, non-uniform deposition, and even de-bonding. Therefore, it is quite essential to have a basic understanding of the functions, benefits, and types of bonding in advance. This...

March 1, 2023Julissa GreenBlog, Thin film Coating, Wafer0

Gallium Arsenide Wafer VS. Silicon Wafer

Introduction With the development of electronic devices, people pay more and more attention to wafers, chips, semiconductors, and integrated circuits. Everyone is trying to figure out the essence of chips. Their mind is full of questions. What is a wafer? What is a chip? What about their relations? What materials do we use to make...

February 21, 2023Julissa GreenBlog, Rare Earth, Sputtering Target0

An Overview of Terbium Sputtering Targets

Introduction Terbium sputtering targets are made from terbium metal. They are used widely in a range of sectors such as tool coatings, optics coatings, and solar coatings. Let’s have a detailed discussion about the features, production, and applications of terbium sputtering targets. Properties Terbium sputtering targets share similar features with terbium metal. Terbium the element...

February 13, 2023Julissa GreenBlog, Sputtering Technology, Thin film Coating0

Do Impurities Always Have A Negative Effect on Sputtering?

Introduction Purity is one of the prime performance requirements of target selection, which has been explained in our previous article. It takes countless money, time, and labor every year to separate impurities. However, do impurities always have a negative influence on sputtering? We are going to explore this question in this article with specific cases....

What Are the Most Important Characteristics of Target Selection？

February 6, 2023Julissa GreenBlog, Sputtering Target, Targets Industry News0

What Are the Most Important Characteristics of Sputtering Target Selection

1. Introduction to Sputtering Target Selection The target quality is rather significant for the coating process, and targets’ features are affected by a variety of parameters like purity, density, porosity, grain sizes, shapes, etc. The better the target quality is, the better performance we have, and the firmer the coating layers are. Here we will...

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