Introduction When it comes to electron beam (e-beam) evaporation, the proper fill rate of a material in an e-beam crucible liner is an important consideration to ensure a successful deposition process. In this article, we will discuss what the fill rate is, why it is significant, and how to determine the proper fill rate for...Continue Reading

Introduction Gallium Arsenide (GaAs) wafers are an essential component in the production of high-performance electronic devices, and they have specific specifications that must be met to ensure their effectiveness. In this article, we will discuss the key specifications of GaAs wafers so that you can have a further understanding of this useful material. What Are...Continue Reading

Thin-film transistors (TFTs) have become integral to a wide variety of electronic devices, including flat-panel displays, touch screens, and solar cells. TFT manufacturing processes are inextricably linked to magnesium oxide (MgO) targets, and this sputtering target for thin-film coating applications is increasingly being used to enhance TFTs’ performance. This article will explore the role of...Continue Reading

Introduction Gallium Arsenide (GaAs) wafers have a variety of applications in the field of electronics, particularly in the production of high-performance electronic devices. In this article, we will explore some common applications of GaAs wafers for electronic device manufacturing and provide a better understanding of their properties and advantages. Properties of Gallium Arsenide Wafer Gallium...Continue Reading

Introduction The deposition rate is an important factor in the field of thin film deposition, as it directly affects the production efficiency and throughput of the process. In this article, we will discuss practical methods to increase the deposition rate for various deposition techniques. Hope that you can have a better understanding of the factors...Continue Reading