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December 20, 2018Julissa GreenBlog, Sputtering Target, Sputtering Technology0

Using Scandium Aluminum Sputtering Target to Prepare ScAlN Film

Scandium nitride (ScN) is a metal nitride semiconductor. The crystal structure of ScN is generally rock salt and non-polar. However, the first principle calculation indicates that ScN may also have a wurtzite structure and can be made into Sc-IIIA-Nitride. The IIIA nitride refers to AlN, GaN, and InN, and the structure of the nitride is...

December 18, 2018Julissa GreenBlog, Sputtering Target, Sputtering Technology0

Recent Studies on Titanium Dioxide Film

Titanium dioxide (TiO2) is a hard and chemically resistant oxide of titanium. Using TiO2 sputtering target can obtain good quality titanium dioxide films, which have been widely used in various applications due to their multiple interesting properties. The first half of this passage introduces some of the properties and applications of titanium oxide film, and the latter...

December 14, 2018Julissa GreenBlog, Sputtering Target0

High-purity Sputtering Target Guarantee the Film Quality

Sputtering is a method of physical vapor deposition (PVD) technologies and is one of the main techniques for preparing electronic thin film materials. It utilizes the ions generated by the ion source to accelerate the aggregation in a high vacuum to form an ion beam with high speed and high energy. The ion beam bombards...

December 12, 2018Julissa GreenBlog, Evaporation Materials0

3 Important Applications of Gold Evaporation Materials

High-purity gold has excellent physical and chemical properties, such as low contact resistance and stability, easy bonding, and easy film formation. By adding other elements, gold can be alloyed to Gold Germanium, Gold Gallium and Gold Beryllium. The flow point of these materials can be changed, and their wettability and adhesion with different materials can...

5 Points For Sputtering Target Maintenance

December 5, 2018Julissa GreenBlog, Sputtering Target0

5 Points You Should Know in the Sputtering Target Maintenance

Sputtering Target Maintenance In order to avoid short circuit and arc initiation caused by the unclean cavity in the sputtering process, it is necessary to remove the accumulated sputtering materials deposited in the middle and on both sides of the sputtering track in stages. It is also helpful for users to continuously sputtering with the...

December 3, 2018Julissa GreenBlog, Ceramics, Cornerstone, Evaporation Materials0

An Overview of Pyrolytic Boron Nitride (PBN)

Introduction In this article, we will explore the unique properties and applications of pyrolytic boron nitride (PBN). Also known as Chemical Vapor-Deposited Boron Nitride (CVD-BN), PBN is a remarkable material that finds use in various industries. Let’s delve into the characteristics and uses of both PBN and its related form, hexagonal boron nitride (hBN). Pyrolytic Boron Nitride...

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