Sputtering targets are necessary raw materials used in physical vapor deposition thin film coating. Sputtering deposition, or sputter coating, is one of the PVD technology. During the coating processes, the sputtering target particles are ejected from a solid sputtering material due to bombardment of the target by energetic particles. It is an electronic process that deposits thin films of metals or other materials onto a variety of surfaces.
As a senior sputtering target manufacturer and exporter, Stanford Advanced Materials (SAM) has a long and good experience for all kinds of sputter target material production. SAM enjoys a very strong reputation for its excellent performance. We provide each sputter target ships complete with a Certificate of Analysis and SDS.
Providing Special Tailor-Made Targets for our clients to research and development (R & D) is the strong point of SAM. Customized target products made of high purity raw material powder with super fine grain size, together with the distinguished homogeneous microstructure to achieve the longer life for targets and desired characteristics for thin film deposition.
Also, we provide in-house Sputter Target Bonding services, including Indium Metallic Bonding and Epoxy Bonding.
SPUTTERING TARGETS WE OFFER: