Chemical Formula: FeSi2 Catalog Number: ST0262 CAS Number: 12022-99-0 Purity: 99.9%, 99.95%, 99.99% Shape: Discs, Plates, Column Targets, Step Targets, Custom-made Iron silicide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality FeSi2 sputtering targets at the most competitive price. Iron Silicide MSDS File Continue Reading
Chemical Formula: HfSi2 Catalog Number: ST0261 CAS Number: 12401-56-8 Purity: >99.5% Shape: Discs, Plates, Column Targets, Step Targets, Custom-made Hafnium silicide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality HfSi2 sputtering targets at the most competitive price.Continue Reading
Chemical Formula: CrSi2 Catalog Number: ST0260 CAS Number: 12018-09-6 Purity: >99.5% Shape: Discs, Plates, Column Targets, Step Targets, Custom-made Chromium silicide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality CrSi2 sputtering targets at the most competitive price. Chromium Silicide MSDS FileContinue Reading
Catalog No. VD0766 Material Silicon Carbide (SiC) Purity 99.5% Shape Powder/ Granule/ Custom-made Stanford Advanced Materials (SAM) is a leading manufacturer and supplier of high purity Silicon Carbide evaporation materials and a wide variety of evaporation materials. We offer our evaporation materials in powder and granule form. Customized forms are also available upon request.Continue Reading
Catalog No. VD0754 Material Silicon Nitride (Si3N4) Purity 99.5% ~ 99.9% Shape Powder/ Granule/ Custom-made Stanford Advanced Materials (SAM) is a leading manufacturer and supplier of high purity Silicon Nitride evaporation materials and a wide variety of evaporation materials. We offer our evaporation materials in powder and granule form. Customized forms are also available upon...Continue Reading
Chemical Formula: SiC Catalog Number: ST0227 CAS Number: 409-21-2 Purity: 99.5% Shape: Discs, Plates, Column Targets, Step Targets, Custom-made The silicon carbide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality silicon carbide sputter targets at the most competitive prices. Silicon Carbide MSDS FileContinue Reading
Chemical Formula: TiN Catalog Number: ST0217 CAS Number: 25583-20-4 Purity: 99.5% Shape: Discs, Plates, Column Targets, Step Targets, Custom-made Stanford Advanced Materials (SAM) offers high-quality Titanium Nitride sputtering targets for thin film deposition applications. With superior hardness, wear resistance, and thermal stability, our TiN sputtering targets meet the demands of diverse industries, including microelectronics, coatings, and decorative applications. Titanium Nitride MSDS...Continue Reading
Chemical Formula: Si3N4 Catalog Number: ST0215 CAS Number: 12033-89-5 Purity: 99.5%, 99.9% Shape: Discs, Plates, Column Targets, Step Targets, Custom-made Silicon nitride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality silicon nitride sputter target at the most competitive price. Silicon Nitride Sputtering Target Safety Data Sheet Continue Reading
Material Type： Silicon (IV) Oxide Symbol： SiO2 Color/Appearance： White, Crystalline Solid Purity：99.9% ~ 99.995% Shape：Powder/ Granule/ Custom-made Stanford Advanced Materials (SAM) is a leading manufacturer and supplier of high purity silicon dioxide evaporation materials and a wide variety of evaporation materials. We offer our evaporation materials in powder and granule form. Customized forms are also available upon request.Continue Reading
