Chemical Formula: (In2O3/Al2O3/ZnO) 65/16/19 wt%
Catalog Number: ST0438
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Indium aluminum zinc oxide sputtering targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.
Indium aluminum zinc oxide sputtering target is composed of indium oxide, aluminum oxide and zinc oxide with the chemical formula of In2O3/Al2O3/ZnO. The composition ratio is 65 wt%, 16 wt% and 19 wt%, respectively. High-purity indium aluminum zinc oxide sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Related products: Indium Sputtering Target, Aluminum Sputtering Target, Zinc Sputtering Target, Oxide Ceramic Sputtering Target
|Material Type||Indium Aluminum Zinc Oxide|
|Type of Bond||Elastomer, Indium|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Other sizes are also available. Please contact us for customized sputtering targets.
The indium aluminum zinc oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our indium aluminum zinc oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
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Used these for classroom chemical projects and experiments. Works great.