Chemical Formula: (In2O3/Al2O3/ZnO) 65/16/19 wt%
Catalog Number: ST0438
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Indium is a chemical element originated from the Latin ‘indicium’, meaning violet or indigo. It was first mentioned in 1863 and observed by F. Reich and T. Richter. The isolation was later accomplished and announced by T. Richter. “In” is the canonical chemical symbol of indium. Its atomic number in the periodic table of elements is 49 with location at Period 5 and Group 13, belonging to the p-block. The relative atomic mass of indium is 114.818(3) Dalton, the number in the brackets indicating the uncertainty.
Aluminum, also called aluminum, is a chemical element originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.
Zinc is a chemical element originated from the German, ‘zinc’, which may in turn be derived from the Persian word ‘sing’, meaning stone. It was early used before 1000 BC and discovered by Indian metallurgists. “Zn” is the canonical chemical symbol of zinc. Its atomic number in the periodic table of elements is 30 with location at Period 4 and Group 12, belonging to the d-block. The relative atomic mass of zinc is 65.409(4) Dalton, the number in the brackets indicating the uncertainty.
Our Indium Aluminum Zinc Oxide Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
We specialize in producing high purity Indium Aluminum Zinc Oxide Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
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