(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0481 Rubidium Sputtering Target, Rb

Chemical Formula: Rb
Catalog Number: ST0481
CAS Number: 7440-17-7
Purity: 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Rubidium Sputter Targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.




Description

Rubidium Sputtering Target Description

Rubidium Rubidium is a chemical element with the symbol Rb and atomic number 37. It is a very soft, silvery-white metal in the alkali metal group. Rubidium metal shares similarities with potassium metal and cesium metal in physical appearance, softness, and conductivity. Rubidium cannot be stored under atmospheric oxygen, as a highly exothermic reaction will ensue, sometimes even resulting in the metal catching fire.

High-purity Rubidium Sputter Targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.

Rubidium Sputtering Target Specifications

Material Type Rubidium
Symbol Rb
Color/Appearance Metallic solid in prescored or break seal ampoule, under argon
Melting Point 38-39 °C
Density 1.53 g/cm3
Boiling Point 686 °C
Young’s Modulus 2.4 GPa
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Packing

Our Rubidium Sputtering Targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM’s Rubidium Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

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Rubidium Sputtering Target, Rb
Average rating:  
 1 reviews
by Cathy R. on Rubidium Sputtering Target, Rb

Everything I have gotten from Stanford Advanced Materials has been at or above my expectations.