(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0406 Planar Tungsten (W) Sputtering Target

Chemical Formula: W
Catalog Number: ST0406
CAS Number: 7440-33-7
Purity: 99.95%, 99.99%, 99.999%
Thermal Conductivity: 174 W/m.K
Melting Point (°C): 3,410
Coefficient of Thermal Expansion: 4.5 x 10-6/K

Planar tungsten sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is your one-stop source to find tungsten sputter targets for sale.


Planar Tungsten Sputtering Target Description

TungstenPlanar tungsten sputtering target is a series of processed products of high-purity tungsten material, and it has a specific size and shape of high-purity tungsten material. It is used for vacuum coating.

Tungsten, also called wolfram, is a chemical element originated from the Swedish ‘tung sten’ meaning heavy stone(W is wolfram, the old name of the tungsten mineral wolframite). It was first mentioned in 1781 and observed by T. Bergman. The isolation was later accomplished and announced by J. and F. Elhuyar. “W” is the canonical chemical symbol of tungsten. Its atomic number in the periodic table of elements is 74 with location at Period 6 and Group 6, belonging to the d-block. The relative atomic mass of tungsten is 183.84(1) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Tungsten Sputtering Target

Planar Tungsten Sputtering Target Specification

Dimension 70” 90” 1/2” < 450 lbs
Material Type Tungsten
Symbol W
Color/Appearance Grayish White, Lustrous, Metallic
Melting Point 3410°C
Density 19.3 g/cm3


Our planar tungsten sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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SAM’s planar tungsten sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.


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Planar Tungsten (W) Sputtering Target
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 1 reviews
by Alex Mills on Planar Tungsten (W) Sputtering Target

Used these for classroom chemical projects and experiments. Works great.