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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

Planar Tungsten (W) Sputtering Target

Chemical Formula: W
Catalog Number: ST0406
CAS Number: 7440-33-7
Purity: 99.95%
Thermal Conductivity: 174 W/m.K
Melting Point (°C): 3,410
Coefficient of Thermal Expansion: 4.5 x 10-6/K




Description

Specification

W L T GW
Dimension 70” 90” 1/2” < 450 lbs

Planar Tungsten (W) Sputtering Target

Chemical Element

Tungsten

TungstenTungsten, also called wolfram, is a chemical element originated from the Swedish ‘tung sten’ meaning heavy stone(W is wolfram, the old name of the tungsten mineral wolframite). It was first mentioned in 1781 and observed by T. Bergman. The isolation was later accomplished and announced by J. and F. Elhuyar. “W” is the canonical chemical symbol of tungsten. Its atomic number in the periodic table of elements is 74 with location at Period 6 and Group 6, belonging to the d-block. The relative atomic mass of tungsten is 183.84(1) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Tungsten (W) Sputtering Target

Related Post: Discovery and development of tungsten | History of Tungsten

Packaging

Our materials are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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Stanford Advanced Materials specializes in producing high purity Planar Tungsten sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.