(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0444 Lanthanum Ferrite Sputtering Target, LaFeO3

Chemical Formula: LaFeO3
Catalog Number: ST0444
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Lanthanum ferrite sputtering targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.


Lanthanum Ferrite Sputtering Target Description

Lanthanum ferrite sputtering target is composed of lanthanum, iron, and oxygen with the chemical formula LaFeO3. High-purity lanthanum ferrite sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.

Related products: Lanthanum Sputtering TargetIron Sputtering Target, Oxide Ceramic Sputtering Target


Lanthanum Ferrite Sputtering Target Specification

Material Type Lanthanum Ferrite
Symbol LaFeO3
Color/Appearance Solid
Melting Point N/A
Density N/A
Type of Bond Elastomer, Indium
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Other sizes are also available. Please contact us for customized sputtering targets.

Lanthanum Ferrite Sputtering Target Application

The lanthanum ferrite sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Lanthanum Ferrite Sputtering Target Bonding Services

Target Bonding Service is available for lanthanum ferrite sputtering targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.

Lanthanum Ferrite Sputtering Target Packaging

Our lanthanum ferrite sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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We specialize in producing high-purity lanthanum ferrite sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

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Lanthanum Ferrite Sputtering Target, LaFeO3
Average rating:  
 2 reviews
by Riley O'Neal on Lanthanum Ferrite Sputtering Target, LaFeO3

Our lab focuses on catalytic materials for environmental applications, and the Lanthanum Ferrite target has proven to be an excellent choice for creating thin film catalysts. The films we've produced show great activity and stability, which is vital for our studies on pollution reduction technologies. The quality of this sputtering target has definitely exceeded our expectations.

by Lorette Carter on Lanthanum Ferrite Sputtering Target, LaFeO3

I used these sputter coater targets for a chemical experiment. These were a great value.