(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0992 Strontium Vanadate Sputtering Target, SrVO3

Chemical Formula SrVO3
Catalog No. ST0992
CAS Number 12345-86-8
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Stanford Advanced Materials (SAM) prides itself on extensive expertise in offering Strontium Vanadate Sputtering Targets of exceptional purity at competitive prices. With years of experience in materials science, SAM ensures the delivery of high-quality targets that meet the most exacting requirements in nanotechnology and thin-film deposition.


Strontium Vanadate Sputtering Target Description

Strontium Vanadate Sputtering Target stands out for its exceptional combination of properties. With its high purity, it ensures consistent and defect-free deposition of films, vital for demanding applications. Its high density offers exceptional physical strength and stability, making it suitable for rigorous industrial conditions. The high sputtering rate ensures efficient film deposition, while the low resistivity facilitates efficient electron transport. Furthermore, SrVO3 exhibits excellent chemical stability, surviving harsh environments and resisting corrosion. Its high-temperature oxidation resistance allows it to withstand extreme conditions without degrading, making it an exceptional choice for a wide range of industrial applications. Its unique properties make the Strontium Vanadate Sputtering Target an essential component in numerous fields, including electronics, communications, energy production, and environmental protection.

Related Product: Strontium Sputtering Target, Strontium Oxide Sputtering Target

Strontium Vanadate Sputtering Target Specifications

Compound Formula SrVO3
Molecular Weight 285.497
Appearance Black Target
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Strontium Vanadate Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Strontium Vanadate Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Strontium Vanadate Sputtering Target Application

  1. Electronics and information industry: In integrated circuits, information storage, liquid crystal display, laser memory, electronic control devices and other fields, Strontium Vanadate Sputtering Targets can be used to prepare various types of thin film materials. For example, in integrated circuits, sputtering targets can be used to prepare conductive films and barrier films.
  2. Wear-resistant materials and high-temperature corrosion-resistant fields: Strontium Vanadate Sputtering Targets can also be used in the fields of wear-resistant materials and high-temperature corrosion-resistant fields due to their excellent physical and chemical properties. For example, in the manufacture of engine parts, thermal energy equipment and other fields, wear-resistant coatings and corrosion-resistant coatings prepared by Strontium Vanadate Sputtering Targets can be applied.
  3. Optical field: In the field of optics, Strontium Vanadate Sputtering Targets can be used to prepare various optical films, such as transmittance enhancement films, reflection films and filters. These optical films have a wide range of applications in optical instruments, photographic equipment, lighting equipment and other fields.

Strontium Vanadate Sputtering Target Packaging

Our Strontium Vanadate Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Strontium Vanadate Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.