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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0909 Copper(I) Oxide Sputtering Targets, Cu2O

Chemical Formula Cu2O
Catalog No. ST0909
CAS Number 1317-39-1
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

The Copper(I) Oxide Sputtering Target is available in various forms, purities, and sizes. Stanford Advanced Materials (SAM) offers high-quality Copper(I) Oxide Sputtering Targets at the most competitive prices.


Copper(I) Oxide Sputtering Targets Description

Copper(I) Oxide Sputtering Target is a specialized material used in sputter deposition. Sputter deposition is a technique for depositing thin films of material onto a substrate in a controlled and precise manner. This process is widely used in manufacturing electronic devices, solar cells, and various other applications.

In the sputtering process, the Copper(I) Oxide Sputtering Target is bombarded with high-energy ions, causing atoms or molecules to be ejected from the target material. These ejected particles then deposit onto a substrate, forming a thin film. The resulting thin film of cobalt oxide may exhibit unique electrical, magnetic, or catalytic properties, depending on the specific application and the desired characteristics of the thin film.

Related Products: Copper Sputtering Target, Copper (II) Selenide Sputtering Target, Copper Indium Sputtering Target

Copper(I) Oxide Sputtering Targets Specifications

Compound Formula Cu2O
Molecular Weight 143.09
Appearance brownish-red solid
Melting Point () 1235
Boiling Point () 1800
Density (g/cm3) 6.0
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Copper(I) Oxide Sputtering Targets Application

Copper(I) Oxide Sputtering Target suits applications such as electrochromic devices, batteries, and catalysts. The use of a Copper(I) Oxide Sputtering Target allows for precise control over the composition and thickness of the deposited thin film, making it a versatile tool in materials science and device manufacturing.

Copper(I) Oxide Sputtering Targets Packaging

Our Copper(I) Oxide Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Copper(I) Oxide Sputtering Targets are available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.