(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0525 Titanium Silicide Sputtering Target, Ti5Si3

Chemical Formula: Ti5Si3
Catalog Number: ST0525
CAS Number: 12067-57-1
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

SAM’s Titanium Silicide Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

Titanium Silicide MSDS File


Titanium Silicide Sputtering Target Description


Titanium Silicide (TiSi2) Sputtering Targets are vital materials for thin film deposition, commonly employed in semiconductor, optical, and electronics industries. Stanford Advanced Materials (SAM) proudly presents a comprehensive range of Titanium Silicide Sputtering Targets, designed to meet your exacting specifications, enabling precise thin-film coatings with exceptional performance.

Related Product: Titanium Sputtering Target.

Titanium Silicide Sputtering Target Specifications

Material Titanium Silicide (TiSi2)
Purity 99.9% and above
Shape Discs, Plates, Custom Shapes, or as per your specifications
Size Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Sputtering Target Bonding Options Indium, Elastomer, or Customized
Surface Roughness As machined or as required
Melting Point Approximately 1,650°C
Available Documents Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and Customized Documents

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Titanium Silicide Sputtering Target Applications

Our Titanium Silicide Sputtering Targets are suitable for a wide range of applications, including:

  • Semiconductor Fabrication: Utilized in the production of semiconductor devices, ensuring precise and reliable thin film coatings.
  • Optical Coatings: Essential for optical components, lenses, and mirrors in the optics industry.
  • Electronics: Key for electronic circuitry and microelectronics.
  • Scientific Research: Employed for thin film deposition in research and development projects.


Our Titanium Silicide Sputtering Targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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Titanium Silicide Sputtering Target, Ti5Si3
Average rating:  
 1 reviews
by Brian Murphy on Titanium Silicide Sputtering Target, Ti5Si3

Five Stars. Great product for the price! Easy to use.