(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0525 Titanium Silicide (Ti5Si3) Sputtering Target

Chemical Formula:Ti5Si3
Catalog Number: ST0525
CAS Number: 12067-57-1
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Titanium Silicide MSDS File


Description of Titanium Silicide Sputtering Target

TitaniumTitanium is a Group IV transition metal that has enjoyed great interest as one of the most important biocompatible metals, thanks to a suite of suitable biological and biomechanical properties. It is a lustrous transition metal with a silver color, low density, and high strength. Titanium is resistant to corrosion in sea water, aqua regia, and chlorine.cIts strong, lightweight characteristics and excellent corrosion resistance make it ideal for ocean liner hulls, aircraft engines, and designer jewelry. The titanium sputtering target is used for CD-ROM, decoration, flat panel displays, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Related Product: Titanium Sputtering Target.

Specifications of Titanium Silicide Sputtering Target

Material Type Titanium Silicide
Symbol Ti5Si3
Color/Appearance Solid
Melting Point /
Density /
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.


Our titanium silicide sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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SAM’s titanium silicide sputter targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

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Titanium Silicide (Ti5Si3) Sputtering Target
Average rating:  
 1 reviews
by Brian Murphy on Titanium Silicide (Ti5Si3) Sputtering Target

Five Stars. Great product for the price! Easy to use.