Chemical Formula: Ti5Si3
Catalog Number: ST0525
CAS Number: 12067-57-1
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
SAM’s Titanium Silicide Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
Titanium Silicide (TiSi2) Sputtering Targets are vital materials for thin film deposition, commonly employed in semiconductor, optical, and electronics industries. Stanford Advanced Materials (SAM) proudly presents a comprehensive range of Titanium Silicide Sputtering Targets, designed to meet your exacting specifications, enabling precise thin-film coatings with exceptional performance.
Related Product: Titanium Sputtering Target.
| Material | Titanium Silicide (TiSi2) |
|---|---|
| Purity | 99.9% and above |
| Shape | Discs, Plates, Custom Shapes, or as per your specifications |
| Size | Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
| Sputtering Target Bonding Options | Indium, Elastomer, or Customized |
| Surface Roughness | As machined or as required |
| Melting Point | Approximately 1,650°C |
| Available Documents | Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and Customized Documents |
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Our Titanium Silicide Sputtering Targets are suitable for a wide range of applications, including:
Our Titanium Silicide Sputtering Targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
Submit your review | |
Five Stars. Great product for the price! Easy to use.
