Chemical Formula: Zr
Catalog Number: ST0408
CAS Number: 7440-67-7
Thermal Conductivity: 22.7 W/m.K
Melting Point (°C): 1,852
Coefficient of Thermal Expansion: 5.7 x 10-6/K
Planar zirconium sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is your one-stop source to find zirconium sputter targets for sale.
Rotatory zirconium sputtering target is a series of processed products of high-purity zirconium material, and it has a specific size and shape of high-purity zirconium material. It is used for vacuum coating.
Zirconium is a chemical element originated from the Persian ‘zargun’, meaning gold coloured. It was first mentioned in 1789 and observed by H. Klaproth. The isolation was later accomplished and announced by J. Berzelius. “Zr” is the canonical chemical symbol of zirconium. Its atomic number in the periodic table of elements is 40 with location at Period 5 and Group 4, belonging to the d-block. The relative atomic mass of zirconium is 91.224(2) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Zirconium Sputtering Target
|Dimension||70”||90”||1/2”||< 450 lbs|
|Melting Point||1,852 °C|
|Color/Appearance||Silvery White, Metallic|
|Theoretical Density||6.49 g/cc|
Our planar zirconium sputtering materials are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
SAM specializes in producing high purity planar zirconium sputtering target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
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I got exactly what I wanted to receive. Exact size as advertised. There are too many options of sizes. Will buy it again.
The high purity Planar Zirconium Sputtering Target did work well for my trials!