(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0472 Terbium Manganate Sputtering Target, TbMnO3

Chemical Formula: TbMnO3
Catalog Number: ST0472
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Terbium Manganate Sputtering Targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.


Terbium Manganate Sputtering Target Description

Terbium Manganate Sputtering Target is composed of terbium, manganese, and oxygen. High-purity terbium manganate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.

Related products: Strontium Sputtering TargetManganese Sputtering TargetOxide Ceramic Sputtering Target

Terbium Manganate Sputtering Target Specification

Material Type Terbium Manganate
Symbol TbMnO3
Color/Appearance Solid
Melting Point /
Density 7.35 g/cm3
Type of Bond Elastomer, Indium
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Other sizes are also available. Please contact us for customized sputtering targets.

Terbium Manganate Sputtering Target Application

Terbium Manganate Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Terbium Manganate Sputtering Target Packaging

Our Terbium Manganate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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We specialize in producing high-purity Terbium Manganate Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.


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Terbium Manganate (TbMnO3) Sputtering Target
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by Peggy Williams on Terbium Manganate (TbMnO3) Sputtering Target

I'm so pleased with the product and the speedily delivery! Great doing business with, I highly recommend!