Chemical Formula: Bi2DyFe4GaO12
Catalog Number: ST0428
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Bismuth dysprosium iron gallate ferrite sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide with us.
Bismuth dysprosium iron gallate is composed of bismuth, dysprosium, iron, gallium, and oxide with the chemical formula of Bi0.9Ca0.1FeO3. High-purity bismuth dysprosium iron gallate sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Related products: Bismuth Sputtering Target, Dysprosium Sputtering Target, Gallium Sputtering Target, Iron Sputtering Target
|Material Type||Bismuth dysprosium iron gallate|
|Type of Bond||Elastomer, Indium|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Other sizes are also available. Please contact us for customized sputtering targets.
Our bismuth dysprosium iron gallate sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
We specialize in producing high-purity bismuth dysprosium iron gallate sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
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Five Stars. Great product for the price! Easy to use.