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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST1008 Zinc Tin Oxide (ZTO) Sputtering Target, ZnO-SnO2

Chemical Formula ZnO-SnO2
Catalog No. ST1008
CAS Number 12036-37-2
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Known for exceptional purity, Stanford Advanced Materials (SAM) offers Zinc Tin Oxide Sputtering Targets. Leveraging extensive expertise in materials science, SAM is committed to delivering tailored solutions and competitive pricing, precisely meeting the demands of nanotechnology and thin-film deposition applications.

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Zinc Tin Oxide (ZTO) Sputtering Target Description

Zinc Tin Oxide (ZTO) Sputtering Target is a compound material widely used in thin film deposition processes. Composed of zinc oxide and tin oxide, ZTO exhibits excellent electrical conductivity and optical transparency, making it ideal for applications in transparent conductive films, such as touchscreens, solar cells, and displays. Its unique properties include high electron mobility, good stability, and compatibility with various substrates. ZTO Sputtering Targets offer precise control over film thickness and composition, enabling the production of high-performance electronic devices with enhanced functionality and durability.

Related Product: Zinc Sputtering Target, Tin Zinc Sputtering Target

Zinc Tin Oxide (ZTO) Sputtering Target Specifications

Compound Formula ZnO-SnO2
Molecular Weight 232.087
Appearance White Target
Melting Point () >570
Density g/cm3 4.25
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Zinc Tin Oxide (ZTO) Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Zinc Tin Oxide (ZTO) Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Zinc Tin Oxide (ZTO) Sputtering Target Application

  1. Transparent Conductive Films: ZTO Sputtering Targets are used to deposit transparent conductive films, which are essential components in touchscreen panels for smartphones, tablets, and other electronic devices.
  2. Solar Cells: ZTO thin films are employed in the fabrication of solar cells to enhance their efficiency and durability.
  3. Displays: ZTO coatings are utilized in the manufacturing of display technologies, including liquid crystal displays (LCDs), organic light-emitting diode (OLED) displays, and thin-film transistors (TFTs).
  4. Smart Windows: ZTO films are incorporated into smart window systems, where their conductivity can be dynamically controlled to regulate the transmission of light and heat.
  5. Thin-Film Transistors (TFTs): ZTO thin films serve as active layers in TFTs, which are crucial components in flat-panel displays, sensors, and electronic circuits.
  6. Flexible Electronics: ZTO materials are compatible with flexible substrates, making them suitable for flexible electronic applications such as wearable devices, flexible displays, and electronic textiles.

Zinc Tin Oxide (ZTO) Sputtering Target Packaging

Our Zinc Tin Oxide (ZTO) Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Zinc Tin Oxide (ZTO) Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.