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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST1000 Nickel Sulfide Sputtering Target, NiS

Chemical Formula NiS
Catalog No. ST1000
CAS Number 16812-54-7
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Embark on a journey into the world of precision with Nickel Sulfide Sputtering Target, offered by Stanford Advanced Materials (SAM). Crafted with meticulous attention, this sputtering target guarantees exceptional quality and performance, making it a superior choice for precise thin film deposition.

SKU: ST1000 Categories: , , Tags: ,


Nickel Sulfide Sputtering Target Description

Nickel Sulfide Sputtering Targets exhibit distinct properties essential for various applications. Recognized for their high purity, these targets are crucial in precise thin-film deposition processes. The unique composition of Nickel Sulfide imparts desirable electrical conductivity, making it valuable in electronic and semiconductor manufacturing. Additionally, Nickel Sulfide demonstrates excellent thermal stability, enhancing its suitability for applications in high-temperature environments. The material’s optical properties also make it relevant in optical coatings and thin-film technologies. Overall, the combination of purity, electrical conductivity, thermal stability, and optical characteristics makes Nickel Sulfide Sputtering Targets versatile in advancing technology across multiple domains.

Related Product: Aluminum Nickel Sputtering Target, Chromium Nickel Sputtering Target

Nickel Sulfide Sputtering Target Specifications

Compound Formula NiS
Molecular Weight 90.75
Appearance Yellow Target
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Nickel Sulfide Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Nickel Sulfide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Nickel Sulfide Sputtering Target Application

Nickel Sulfide Sputtering Targets find diverse applications across advanced technologies. Primarily employed in thin-film deposition processes, these targets are integral to electronic and semiconductor manufacturing due to their high purity and desirable electrical conductivity. Nickel Sulfide’s excellent thermal stability makes it suitable for applications in high-temperature environments, contributing to the production of robust electronic components. Furthermore, its optical properties render it valuable in optical coatings and thin-film technologies, extending its utility to various fields such as sensors and optoelectronics. Overall, Nickel Sulfide Sputtering Targets play a crucial role in advancing technology in electronic, optical, and semiconductor applications.

Nickel Sulfide Sputtering Target Packaging

Our Nickel Sulfide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Nickel Sulfide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.