| Chemical Formula | Ni-Fe |
| Catalog No. | ST0999 |
| CAS Number | – |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
Stanford Advanced Materials (SAM) proudly leverages extensive materials science expertise to offer competitively priced, exceptionally pure Nickel Iron Sputtering Targets. With a commitment to excellence, SAM ensures the delivery of top-notch targets meeting rigorous standards in nanotechnology and thin-film deposition.
Nickel Iron Sputtering Targets possess notable properties essential for diverse applications. Renowned for their exceptional purity, these targets play a vital role in precise thin-film deposition processes. The Nickel Iron composition ensures desirable magnetic and electrical properties, making them valuable for applications in electronics, magnetics, and sensor technologies. With excellent corrosion resistance, these targets contribute to the production of durable and reliable coatings. Overall, the distinctive properties of Nickel Iron Sputtering Targets make them integral in advancing various technological fields.
Related Product: Aluminum Nickel Sputtering Target, Chromium Nickel Sputtering Target
| Compound Formula | Ni-Fe |
| Appearance | Silver Grey Target |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Nickel Iron Sputtering Targets serve versatile purposes across advanced technologies. Primarily employed in thin-film deposition, these targets play a crucial role in electronics, magnetics, and sensor technologies. The exceptional purity of Nickel Iron ensures precise coating, making them vital in the production of high-performance electronic devices and sensors. Their unique magnetic and electrical properties contribute to the development of efficient components, such as magnetic storage devices. With excellent corrosion resistance, these targets find applications in creating durable and reliable coatings, establishing Nickel Iron Sputtering Targets as key materials in advancing various technological applications.
Our Nickel Iron Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Nickel Iron Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.
