ST0991 Strontium Iron Oxide Sputtering Target, SrFe12O19

Strontium Iron Oxide Sputtering Target Description

Strontium Iron Oxide Sputtering Target is a remarkable sputtering target that boasts a unique combination of properties. With its high purity, the material ensures a consistent and defect-free deposition of films. Its high density offers excellent physical strength and stability, making it suitable for demanding applications. The high sputtering rate ensures efficient film deposition, while the low resistivity facilitates efficient electron transport. Furthermore, the Strontium Iron Oxide Sputtering Target exhibits excellent chemical stability, surviving harsh environments and resisting corrosion. Its high-temperature oxidation resistance allows it to withstand extreme conditions without degrading, making it an exceptional choice for a wide range of industrial applications.

Related Product: Strontium Sputtering Target, Strontium Oxide Sputtering Target

Strontium Iron Oxide Sputtering Target Specifications

Strontium Iron Oxide Sputtering Target Handling Notes

1. Indium bonding is recommended for the Strontium Iron Oxide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Strontium Iron Oxide Sputtering Target Application

1. Magnetic recording and storage: Strontium-Iron Oxide is widely used in the field of magnetic recording and storage due to its excellent magnetic properties, such as high saturation magnetisation strength and good magnetic stability. As a sputtering target, the Strontium Iron Oxide Sputtering Target can be used to prepare components such as magnetic heads, magnetic recording media and magnetic memories, thus improving the performance of magnetic recording and storage technology.
2. Electronic Device Manufacturing: In the field of electronic device manufacturing, Strontium Iron Oxide Sputtering Targets can be used to prepare a variety of electronic components, such as magnetic films, magnetic resistors and transformers. These components have important applications in electronic devices and systems and can improve the performance and stability of electronic devices.
3. Energy conversion and storage: Strontium Iron Oxide Sputtering Targets are used to prepare high-efficiency, long-life electrode materials for solar cells, fuel cells and electrochemical devices. These electrode materials can improve the efficiency and stability of energy conversion and storage, and promote the development of renewable energy technologies.
4. Sensor manufacturing: Since Strontium-Iron Oxide has excellent magnetic and electrical properties, it can be used to manufacture various sensors, such as magnetic field sensors, current sensors and position sensors. These sensors have a wide range of applications in fields such as industrial automation, automotive electronics and medical devices.
5. Other fields: In addition to the above fields, Strontium Iron Oxide Sputtering Targets can also be used in microelectronic packaging, precision machining, medical devices and aerospace and aviation.

Strontium Iron Oxide Sputtering Target Packaging

Our Strontium Iron Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Strontium Iron Oxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.