(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0965 Gallium (III) Sulphide Sputtering Target, Ga2S3

Chemical Formula Ga2S3
Catalog No. ST0965
CAS Number 12024-22-5
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Ensuring high purity and uniformity, the Gallium (III) Sulphide Sputtering Target promises reliable coating in advanced applications. With unique optical properties, Gallium Sulphide stands out in optics and electronics. Explore our platform for a curated selection of top-quality sputtering targets, embodying professionalism and excellence. Trust in our commitment to meet your specialized thin film technology needs, providing reliability and precision in every application.


Gallium (III) Sulphide Sputtering Target Description

Gallium (III) Sulphide Sputtering Targets have good uniformity and controllability during thin film deposition, supporting the formation of reliable films on substrates. Gallium Sulphide excels in optics, with transmission and absorption properties that make it widely used in optical coatings and optical devices. As a semiconductor material, Gallium Sulphide shows electrical properties that make it suitable for the preparation of electronic devices. Gallium Sulphide is stable in certain environments, which affects its long-term stability in different applications.


Related Product: Gallium (III) Selenide Sputtering Target, CIGS Copper Indium Gallium (III) Sulphide Sputtering Target


Gallium (III) Sulphide Sputtering Target Specifications

Compound Formula Ga2S3
Molecular Weight 235.64
Appearance Silver Grey Target
Melting Point 1255 °C
Density 3.65 g/cm3
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Gallium (III) Sulphide Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Gallium (III) Sulphide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Gallium (III) Sulphide Sputtering Target Application

  1. Optical Applications: Gallium (III) Sulphide Sputtering Targets are used in optical devices for their unique optical properties, such as in the preparation of transparent conductive films, optical coatings, and infrared windows.
  2. Electronics: As a semiconductor material, Gallium Sulphide is used in the preparation of electronic devices, including photodiodes (LEDs) and other electronic components.
  3. Thin Film Technology: Gallium (III) Sulphide Sputtering Targets play a key role in the thin film deposition process, forming uniform, reliable films on substrates for a wide range of optical, electronic and magnetic applications.
  4. Optical Coatings: Thin films prepared from Gallium Sulphide can be used for optical coatings to improve the optical properties of the material for reflective, transmissive and absorptive applications.

Gallium (III) Sulphide Sputtering Target Packaging

Our Gallium (III) Sulphide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Gallium (III) Sulphide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications. Get an inquiry right now.