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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0959 Dysprosium-Iron Sputtering Target, DyFe

Chemical Formula Dy-Fe
Catalog No. ST0959
CAS Number
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Dysprosium-Iron Sputtering Target is provided by Stanford Advanced Materials (SAM), which is a high-quality material for thin film deposition. Engineered with precision, this sputtering target ensures exceptional performance in diverse applications. Explore advanced thin film technology with Dysprosium-Iron Sputtering Target, a symbol of professional excellence in the realm of sputtering targets.


Dysprosium-Iron Sputtering Target Description

Dysprosium-Iron Sputtering Target is a specialized material used in the sputtering process for thin film deposition. Sputtering involves bombarding a target material with high-energy ions, causing atoms to be ejected from the target surface. These ejected atoms then deposit onto a substrate, creating a thin film with specific properties.

Precision dysprosium and ferrous alloys are used to ensure that precise chemistry is achieved during sputtering, improving film performance and stability. Dysprosium-Iron Sputtering Targets provided by Stanford Advanced Materials (SAM) are rigorously prepared to provide exceptional high purity, helping to eliminate impurities and ensure film purity and uniformity. Dysprosium-Iron Sputtering Targets exhibit excellent electrical conductivity and support uniform deposition on the target surface, improving deposition efficiency and film quality. A stable crystal structure ensures outstanding performance over long periods, reducing equipment maintenance and extending service life.

Related Product: Dysprosium Sputtering Target, Dysprosium Oxide Sputtering Target

Dysprosium-Iron Sputtering Target Specifications

Compound Formula DyFe
Molecular Weight
Appearance Black Target
Melting Point
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Dysprosium-Iron Sputtering Target Handling Notes

  1. Indium bonding is recommended for Dysprosium-Iron Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Dysprosium-Iron Sputtering Target Application

  1. Magnetic storage technology: Due to their high-quality magnetic properties, Dysprosium-Iron Sputtering Targets are widely used in the preparation of magnetic disks and magnetic sensors, increasing storage density and sensor performance.
  2. Magnetic Sensor Manufacturing: Used in the production of high-performance magnetic sensors, for example in navigation systems and magnetometers, to ensure sensitivity and accuracy.
  3. Optical thin-film technology: Dysprosium-Iron Sputtering Targets are used to deposit magnetic thin films in the manufacture of lasers and optical devices, enabling precise control of optical properties.
  4. Electronic component applications: Used in the preparation of advanced electronic components such as magnetoresistors and magneto-electric inductors, providing high-performance materials for the electronics industry.

Dysprosium-Iron Sputtering Target Packaging

Our Dysprosium-Iron Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Dysprosium-Iron Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

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