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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0957 Barium Bismuth Oxide Sputtering Target, BaBiO3

Chemical Formula BaBiO3
Catalog No. ST0957
CAS Number
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Crafted for precision in semiconductor applications, Stanford Advanced Materials (SAM) presents the Barium Bismuth Oxide Sputtering Target. This high-quality thin film deposition material guarantees superior film quality, making it an ideal choice for advanced electronic device manufacturing. SAM’s engineering expertise ensures excellence, providing professionals with a specialized sputtering target to enhance thin film deposition with precision and superior performance.


Barium Bismuth Oxide Sputtering Target Description

Barium Bismuth Oxide Sputtering Target is a specialized material utilized in the sputtering process for thin film deposition. In sputtering, high-energy ions are directed at a target material, causing the release of atoms from the target surface. These atoms then deposit onto a substrate, forming a thin film with specific properties.

Barium Bismuth Oxide has garnered significant attention in the realm of material science owing to its distinctive properties. Notably, Barium Bismuth Oxide has been observed to exhibit superconducting characteristics in specific studies, elevating its significance in the exploration of superconducting materials. The manifestation of superconductivity in Barium Bismuth Oxide positions it as a subject of keen research interest for applications in low-temperature technologies and advancements in the field of materials with zero electrical resistance.

In addition to its superconducting attributes, Barium Bismuth Oxide may also demonstrate magnetic properties, primarily influenced by the presence of bismuth within its composition.  This dual nature of Barium Bismuth Oxide, showcasing both superconducting and magnetic properties, underscores its versatility and potential for applications in various scientific and technological domains.

Related Product: Barium Titanate Sputtering Target, Barium Zirconate Sputtering Target

Barium Bismuth Oxide Sputtering Target Specifications

Compound Formula BaBiO3
Molecular Weight 394.31
Appearance White Target
Melting Point
Density 7.6 g/cm3
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Barium Bismuth Oxide Sputtering Target Handling Notes

  1. Indium bonding is recommended for Barium Bismuth Oxide Sputtering Targets, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Barium Bismuth Oxide Sputtering Target Application

  1. Superconducting electronics: Barium Bismuth Oxide has demonstrated superconductivity in many studies, which makes Barium Bismuth Oxide Sputtering Targets potentially useful in the preparation of superconducting electronic devices. The superconducting properties could be used in the manufacture of superconducting cables, magnetic resonance imaging devices and other fields.
  2. Optoelectronics: Barium Bismuth Oxide’s optical properties may make it useful in the field of optoelectronics for the preparation of optical components such as photodiodes and lasers.
  3. Magnetic materials research: Due to the presence of bismuth, Barium Bismuth Oxide may exhibit certain magnetic properties, and therefore can be used in magnetic materials research, which may involve magnetic memory devices and other fields.
  4. Preparation of electrical devices: The electrical properties of Barium Bismuth Oxide Sputtering Targets may make them suitable for the thin film deposition of electrical devices, such as thin film transistors.

Barium Bismuth Oxide Sputtering Target Packaging

Our Barium Bismuth Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Barium Bismuth Oxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

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Barium Bismuth oxide Sputtering Target, BaBiO3
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