|99.9%, 99.95%, 99.99%, 99.995%, 99.999%
|Discs, Plates, Column Targets, Step Targets, Custom-made
Crafted for precision in semiconductor applications, Stanford Advanced Materials (SAM) presents the Barium Bismuth Oxide Sputtering Target. This high-quality thin film deposition material guarantees superior film quality, making it an ideal choice for advanced electronic device manufacturing. SAM’s engineering expertise ensures excellence, providing professionals with a specialized sputtering target to enhance thin film deposition with precision and superior performance.
Barium Bismuth Oxide Sputtering Target is a specialized material utilized in the sputtering process for thin film deposition. In sputtering, high-energy ions are directed at a target material, causing the release of atoms from the target surface. These atoms then deposit onto a substrate, forming a thin film with specific properties.
Barium Bismuth Oxide has garnered significant attention in the realm of material science owing to its distinctive properties. Notably, Barium Bismuth Oxide has been observed to exhibit superconducting characteristics in specific studies, elevating its significance in the exploration of superconducting materials. The manifestation of superconductivity in Barium Bismuth Oxide positions it as a subject of keen research interest for applications in low-temperature technologies and advancements in the field of materials with zero electrical resistance.
In addition to its superconducting attributes, Barium Bismuth Oxide may also demonstrate magnetic properties, primarily influenced by the presence of bismuth within its composition. This dual nature of Barium Bismuth Oxide, showcasing both superconducting and magnetic properties, underscores its versatility and potential for applications in various scientific and technological domains.
|Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Our Barium Bismuth Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Barium Bismuth Oxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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