ST0953 Arsenic Telluride Sputtering Target, As2Te3

Arsenic Telluride Sputtering Target Description

Arsenic Telluride Sputtering Target is a specialized material used in the process of sputtering, a technique commonly employed in thin film deposition for various applications. In this context, Arsenic Telluride serves as the target material that is bombarded with energetic particles, typically ions, to release atoms. These atoms then deposit as a thin film onto a substrate, creating a coating with specific properties.

The mentioned properties of Arsenic Telluride Sputtering Targets include excellent chemical stability, high electrical conductivity, thermal stability, antioxidant properties, precision design, and a specialized manufacturing process. These attributes make Arsenic Telluride Sputtering Targets particularly valuable in the semiconductor industry and advanced electronic device manufacturing, where precise and reliable thin film deposition is crucial for optimal device performance.

Related Product: Arsenic Triselenide Sputtering Target, Arsenic Trisulfide Sputtering Target

Arsenic Telluride Sputtering Target Specifications

Arsenic Telluride Sputtering Target Handling Notes

1. Indium bonding is recommended for the Arsenic Telluride Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Arsenic Telluride Sputtering Target Application

1. Semiconductor industry: As a thin film deposition material, Arsenic Telluride Sputtering Targets are used in semiconductor manufacturing to produce advanced electronic devices such as transistors and integrated circuits.
2. Optoelectronics: The targets are widely used in the field of optoelectronics for the preparation of optoelectronic devices, including lasers and photodiodes.
3. Optical coatings: Arsenic Telluride Sputtering Targets are used to prepare high-quality optical coatings for the production of optical components such as anti-reflective coatings and optical filters.
4. Magnetic storage: In magnetic storage technology, Arsenic Telluride Sputtering Targets can be used in the preparation of magnetic films to improve the performance of magnetic storage devices.
5. Nanotechnology research: Arsenic Telluride Sputtering Targets are used in nanotechnology research for the preparation of nanoscale films and structures due to their precision preparation and excellent performance.
6. Energy storage: Arsenic Telluride Sputtering Targets are also used to prepare high-performance electrode materials in the research of new batteries and supercapacitors.

Arsenic Telluride Sputtering Target Packaging

Our Arsenic Telluride Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Arsenic Telluride Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.