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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0940 Aluminum Antimonide Sputtering Target, AlSb

Chemical Formula AlSb
Catalog No. ST0940
CAS Number 25152-52-7
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

The Aluminum Antimonide Sputtering Target is available in various forms, purities, sizes, and prices. Drawing on our vast expertise, Stanford Advanced Materials (SAM) excels in offering Aluminum Antimonide Sputtering Targets known for their high purity and competitive pricing, which will be good materials for your research.


Aluminum Antimonide Sputtering Target Description

Aluminum Antimonide Sputtering Target is a specialized material used in the sputtering process for thin film deposition. Aluminum antimonide is a semiconductor material. It is often used in the development of compound semiconductors and can be applied in electronic and optoelectronic devices. Aluminum antimonide thin films deposited using sputtering targets can be used in various applications, including semiconductor devices, infrared detectors, and other electronic or optoelectronic components.

Aluminum Antimonide Sputtering Targets supplied by Stanford Advanced Materials (SAM) are of extremely high purity, which guarantees stable physical and chemical properties, as well as good electrical and optical properties, and can be used in scientific research and production environments with high material requirements.

Related Product: Aluminum Nitride Sputtering Target, Aluminum Telluride Sputtering Target

Aluminum Antimonide Sputtering Target Specifications

Compound Formula AlSb
Molecular Weight 148.73
Appearance Black Target
Melting Point 1,060℃
Density 4.26
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Aluminum Antimonide Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Aluminum Antimonide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Aluminum Antimonide Sputtering Target Application

  • Semiconductor Devices: Thin films of AlSb deposited using sputtering targets can be used in the fabrication of semiconductor devices. Its properties make it suitable for applications in electronic and optoelectronic components.
  • Infrared Detectors: Aluminum antimonide is known for its performance in the infrared region of the electromagnetic spectrum. Thin films of AlSb can be used in the production of infrared detectors, sensors, and imaging devices.
  • Thermoelectric Devices: Thin films of AlSb may find applications in thermoelectric devices for energy harvesting and cooling applications.
  • Optoelectronic Devices: The semiconductor nature of aluminum antimonide makes it suitable for use in optoelectronic devices such as light-emitting diodes (LEDs) or photodetectors.

Aluminum Antimonide Sputtering Target Packaging

Our Aluminum Antimonide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Aluminum Antimonide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

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