ST0922 Yttrium Iron Garnet PLD Target, Y3Fe5O12, YIG

Yttrium Iron Garnet PLD Target Description

Yttrium Iron Garnet PLD Target is a specialized material used in the sputter deposition process. Sputter deposition is a widely used technique in the production of thin films for various applications in electronics, magnetics, and optics.

YIG is known for its unique magnetic and optical properties, making it valuable in various applications. The sputter deposition process involves bombarding the target material (Yttrium Iron Garnet Sputtering Target) with high-energy ions in a vacuum chamber. This causes atoms or particles from the target material to be ejected, and these ejected particles then deposit onto a substrate, forming a thin film.

Related Product: Yttrium Oxide Sputtering Target

Yttrium Iron Garnet PLD Target Specifications

Yttrium Iron Garnet PLD Target Handling Notes

1. Indium bonding is recommended for Yttrium Iron Garnet PLD Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity, and is susceptible to thermal shock.

Yttrium Iron Garnet PLD Target Application

Yttrium Iron Garnet PLD Target is widely used in various applications in electronics, magnetics, and optics.

Yttrium Iron Garnet PLD Target Packaging

Our Yttrium Iron Garnet PLD Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Yttrium Iron Garnet PLD Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.