(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0458 Neodymium Aluminate Sputtering Target, NdAlO3

Chemical Formula: NdAlO3
Catalog Number: ST0458
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Neodymium Aluminate Sputtering Targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.


Neodymium Aluminate Sputtering Target Description

The Neodymium Aluminate Sputtering Target is composed of neodymium, aluminum, and oxygen. High-purity neodymium aluminate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.

Related products: Neodymium Sputtering TargetAluminum Sputtering Target, Oxide Ceramic Sputtering Target



Neodymium Aluminate Sputtering Target Specification

Material Type Neodymium Aluminate
Symbol NdAlO3
Color/Appearance Light gray target
Melting Point 2233 °C
Density 6.7-7.14 g/cm3
Type of Bond Elastomer, Indium
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Other sizes are also available. Please contact us for customized sputtering targets.

Neodymium Aluminate Sputtering Target Application

The Neodymium Aluminate Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Neodymium Aluminate Sputtering Target Packaging

Our Neodymium Aluminate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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We specialize in producing high purity Neodymium Aluminate Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

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Neodymium Aluminate Sputtering Target, NdAlO3
Average rating:  
 1 reviews
by Scott Clair on Neodymium Aluminate Sputtering Target, NdAlO3

Everything was packed into a box into 3 separate smaller boxes and in the 3 smaller boxes each set was then packed again into individual boxes. The largest shipping box had some shipping air cushions. Everything seemed OK. Good.