Chemical Formula: GeO2
Catalog Number: ST0418
CAS Number: 1310-53-8
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The germanium dioxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality germanium oxide sputter targets at the most competitive prices.
Germanium dioxide sputtering target is a type of oxide ceramic sputtering target composed of Germanium and oxide.
Germanium is a chemical element originated from Germany (with the Latin name Germania). It was first mentioned in 1886 and observed by A. Winkler. “Ge” is the canonical chemical symbol of germanium. Its atomic number in the periodic table of elements is 32 with location at Period 4 and Group 14, belonging to the p-block. The relative atomic mass of germanium is 72.64(1) Dalton, the number in the brackets indicating the uncertainty.
Related product: Germanium Sputtering Target
|Material Type||Germanium Dioxide|
|Melting Point||1,115° C (2,039° F)|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
The germanium dioxide sputtering target from Stanford Advanced Materials is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s germanium dioxide sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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great price & quality. Will buy it again.