(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0895 Cobalt Iron Boron Sputtering Target, Co/Fe/B

Chemical Formula Co/Fe/B
Catalog No. ST0895
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

The Cobalt Iron Boron Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality Cobalt Iron Boron Sputtering Target at the most competitive prices.




Description

Cobalt Iron Boron Sputtering Target Description

Cobalt Iron Boron Sputtering Target is made by combining cobalt, iron, and boron in the desired ratio and then compacting and sintering the mixture into a solid target form. The target is then mounted inside a sputtering system, where it is bombarded with high-energy ions to release atoms that deposit onto the substrate.

Sputtering is a process used in the deposition of thin films where atoms from a target material are ejected onto a substrate to form a film. In the case of CoFeB sputtering target, it is used to create thin film magnetic devices like magnetic tunnel junctions (MTJs), which are essential components in spintronics and magnetic storage devices.

Cobalt Iron Boron Sputtering Target Specifications

Compound Formula Co/Fe/B
Appearance Metallic target
Molecular Weight 135.943
Density 0.986 g/cm3
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Cobalt Iron Boron Sputtering Target Handling Notes

  1. Indium bonding is recommended for Cobalt Iron Boron Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity, and is susceptible to thermal shock.

Cobalt Iron Boron Sputtering Target Application

Cobalt Iron Boron Sputtering Target is commonly used for applications such as optical coatings, electronic devices, energy storage, and catalysts. The precise composition and manufacturing of the sputtering target ensure a uniform and controlled deposition process, resulting in high-quality thin films with desired properties.

Cobalt Iron Boron Sputtering Target Packaging

Our Cobalt Iron Boron Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.

Get Contact

SAM’s Cobalt Iron Boron Sputtering Targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

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Cobalt Iron Boron Sputtering Target, Co/Fe/B
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