ST1002 Samarium Nickel Oxide Sputtering Target, SmNiO3

Samarium Nickel Oxide Sputtering Target Description

Stanford Advanced Materials (SAM) proudly introduces Samarium Nickel Oxide Sputtering Targets, distinguished by their remarkable purity and unique material composition. This exceptional purity ensures the targets’ efficacy in precise thin-film deposition processes, playing a vital role in the creation of high-quality electronic devices. The distinctive magnetic and electronic characteristics inherent in Samarium Nickel Oxide make these targets invaluable in applications ranging from electronics to magnetics and sensor technologies. SAM’s commitment to excellence is underscored by the provision of these targets, contributing significantly to advancements in materials engineering and deposition technologies. The exceptional properties of Samarium Nickel Oxide Sputtering Targets position them at the forefront of cutting-edge technological innovations.

Related Product: Samarium Sputtering Target, Samarium Oxide Sputtering Target

Samarium Nickel Oxide Sputtering Target Specifications

Samarium Nickel Oxide Sputtering Target Handling Notes

1. Indium bonding is recommended for the Samarium Nickel Oxide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Samarium Nickel Oxide Sputtering Target Application

1. Electronics: Samarium Nickel Oxide Sputtering Targets are integral to electronics manufacturing, contributing to the creation of high-performance electronic devices with their unique electronic properties.
2. Magnetics: The targets find crucial applications in magnetics, where their distinctive magnetic characteristics play a pivotal role in the development of precise and efficient magnetic components.
3. Sensor Technologies: Samarium Nickel Oxide is valuable in sensor technologies, showcasing its versatility and adaptability in creating advanced sensors with enhanced functionalities.
4. Thin-Film Deposition: These targets are instrumental in thin-film deposition processes, ensuring precise and uniform coatings essential for various industrial and research applications.
5. Materials Engineering Advancements: Stanford Advanced Materials (SAM) provides these targets with a commitment to excellence, contributing significantly to advancements in materials engineering and deposition technologies.

Samarium Nickel Oxide Sputtering Target Packaging

Our Samarium Nickel Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Samarium Nickel Oxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.