ST0986 Silicon Dioxide-Zinc Sulphide Sputtering Target, SiO2-ZnS

Silicon Dioxide-Zinc Sulphide Sputtering Target Description

Silicon Dioxide-Zinc Sulphide Sputtering Targets are specialized materials used in the process of sputter deposition. Sputtering is a thin-film deposition technique where atoms or molecules from a target material are ejected and then deposited onto a substrate, forming a thin film. In the case of Silicon Dioxide-Zinc Sulphide Sputtering Targets, the composition includes Silicon Dioxide (SiO2) and Zinc Sulphide (ZnS). These targets are commonly used in applications such as optical coatings, thin film deposition for electronic devices, and other high-tech industries. The unique properties of Silicon Dioxide (SiO2) and Zinc Sulphide (ZnS) make them suitable for applications where transparency, precision, and specific optical characteristics are crucial.

Related Product: Aluminum Silicon Copper Sputtering Target, Aluminum Silicon Sputtering Target

Silicon Dioxide-Zinc Sulphide Sputtering Target Specifications

Silicon Dioxide-Zinc Sulphide Sputtering Target Handling Notes

1. Indium bonding is recommended for the Silicon Dioxide-Zinc Sulphide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Silicon Dioxide-Zinc Sulphide Sputtering Target Application

1. Optical Coatings: Silicon Dioxide-Zinc Sulphide Sputtering Targets are commonly utilized in the deposition of thin films for optical coatings. These coatings may be applied to lenses, mirrors, and other optical components to enhance light transmission, reduce reflection, or achieve specific optical properties.
2. Electronics: The thin films deposited by sputtering with Silicon Dioxide-Zinc Sulphide Sputtering Targets can be used in electronic devices. These applications may include semiconductor manufacturing, where precise and uniform thin films are essential for device performance.
3. Solar Cells: Silicon Dioxide-Zinc Sulphide Sputtering Targets contribute to the production of thin films used in solar cells. The transparency and optical properties of these films are crucial for optimizing light absorption and energy conversion efficiency.
4. Photonics and Optoelectronics: The unique combination of Silicon Dioxide and Zinc Sulphide makes Silicon Dioxide-Zinc Sulphide Sputtering Targets suitable for applications in photonics and optoelectronics. These include the manufacturing of photonic devices, laser components, and light-emitting diodes (LEDs).
5. Sensor Technologies: SiO2-ZnS thin films can be employed in the fabrication of sensors, particularly those requiring optical or electronic properties for detection purposes.

Silicon Dioxide-Zinc Sulphide Sputtering Target Packaging

Our Silicon Dioxide-Zinc Sulphide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Silicon Dioxide-Zinc Sulphide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.