(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0983 Ruthenium Oxide Sputtering Target, RuO2

Chemical Formula RuO2
Catalog No. ST0983
CAS Number 12036-10-1
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Stanford Advanced Materials (SAM) is dedicated to delivering Ruthenium Oxide Sputtering Targets with a strong emphasis on superior quality and cost-effectiveness. Our competitive pricing establishes these sputtering targets as the optimal choice for a diverse range of high-tech applications, guaranteeing clients unparalleled quality without compromising affordability.




Description

Ruthenium Oxide Sputtering Target Description

Ruthenium Oxide is an excellent conductive oxide, so Ruthenium Oxide Sputtering Targets are widely used in the preparation of electronic devices. This includes preparing electrodes, capacitors, and other conductive layers. These targets typically have good mechanical strength, giving them excellent wear and corrosion resistance in processes. Ruthenium Oxide remains relatively stable over a certain temperature range, which makes it excellent in high-temperature applications, such as in high-temperature electronic devices. Although Ruthenium Oxide itself is usually transparent, the optical properties of Ruthenium Oxide films can be optimized by adjusting deposition conditions, giving it some flexibility in optical applications. Ruthenium Oxide Sputtering Targets are widely used in the fields of electronic devices, optical coatings, and energy storage, especially in the preparation of high-performance batteries such as supercapacitors and lithium-ion batteries.

Related Product: Osmium Rubidium Sputtering Target, Platinum Ruthenium Sputtering Target

Ruthenium Oxide Sputtering Target Specifications

Compound Formula RuO2
Molecular Weight 133.07
Appearance Black Target
Melting Point 1,200° C
Density 6.97 g/cm3
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Ruthenium Oxide Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Ruthenium Oxide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Ruthenium Oxide Sputtering Target Application

  1. Electronic devices: Ruthenium Oxide Sputtering Targets play a key role in the preparation of electronic devices and are used to form conductive films such as electrodes and conductive layers. This is critical for making high-performance semiconductor devices, capacitors and other electronic components.
  2. Optical coatings: Due to their superior optical properties, Ruthenium Oxide Sputtering Targets are widely used to prepare optical coatings, including anti-reflective coatings and mirror coatings. The application of these coatings in optical components improves the performance of optical devices.
  3. Energy Storage: In the energy field, Ruthenium Oxide Sputtering Targets play a key role in the preparation of high-performance batteries such as supercapacitors and lithium-ion batteries. Its electrical conductivity and thermal stability make it a preferred material, improving battery performance and life.
  4. Sensor technology: Ruthenium Oxide is also used in sensor technology, especially at high temperatures and harsh environmental conditions, where its stability and conductive properties make it an ideal sensor material.
  5. High-temperature electronic devices: Due to their good thermal stability, Ruthenium Oxide Sputtering Targets perform well in preparing high-temperature electronic devices, meeting the needs of some special environments.

Ruthenium Oxide Sputtering Target Packaging

Our Ruthenium Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

Get Contact

SAM’s Ruthenium Oxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.