Chemical Formula | RuO2 |
Catalog No. | ST0983 |
CAS Number | 12036-10-1 |
Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
Stanford Advanced Materials (SAM) is dedicated to delivering Ruthenium Oxide Sputtering Targets with a strong emphasis on superior quality and cost-effectiveness. Our competitive pricing establishes these sputtering targets as the optimal choice for a diverse range of high-tech applications, guaranteeing clients unparalleled quality without compromising affordability.
Ruthenium Oxide is an excellent conductive oxide, so Ruthenium Oxide Sputtering Targets are widely used in the preparation of electronic devices. This includes preparing electrodes, capacitors, and other conductive layers. These targets typically have good mechanical strength, giving them excellent wear and corrosion resistance in processes. Ruthenium Oxide remains relatively stable over a certain temperature range, which makes it excellent in high-temperature applications, such as in high-temperature electronic devices. Although Ruthenium Oxide itself is usually transparent, the optical properties of Ruthenium Oxide films can be optimized by adjusting deposition conditions, giving it some flexibility in optical applications. Ruthenium Oxide Sputtering Targets are widely used in the fields of electronic devices, optical coatings, and energy storage, especially in the preparation of high-performance batteries such as supercapacitors and lithium-ion batteries.
Related Product: Osmium Rubidium Sputtering Target, Platinum Ruthenium Sputtering Target
Compound Formula | RuO2 |
Molecular Weight | 133.07 |
Appearance | Black Target |
Melting Point | 1,200° C |
Density | 6.97 g/cm3 |
Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Our Ruthenium Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Ruthenium Oxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.