(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0974 Manganese-Iron Oxide Sputtering Target, MnFe2O4

Chemical Formula MnFe2O4
Catalog No. ST0974
CAS Number 12063-10-4
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Celebrated for their unmatched purity and competitive pricing, the Manganese-Iron Oxide Sputtering Targets from Stanford Advanced Materials (SAM) showcase excellence. With a profound expertise in materials science, we guarantee exceptional performance and reliability by applying meticulous craftsmanship in the production of these targets.


Manganese-Iron Oxide Sputtering Target Description

Distinguished by their exceptional purity, Manganese-Iron Oxide Sputtering Targets stand as a guarantee for reliable and uncontaminated performance throughout thin film preparation processes. Beyond their remarkable electrical conductivity, which positions them as the material of choice in sectors like the semiconductor industry, these targets are composed of manganese and iron oxides. This composition imparts outstanding chemical stability, ensuring steadfastness across a diverse range of thin film deposition procedures. Furthermore, owing to their distinctive makeup, these targets offer the advantage of tunable optical properties, making them a versatile choice for applications in optical coatings and the meticulous preparation of optical devices.

Related Product: Manganese Sputtering Target, Manganese Oxide Sputtering Target

Manganese-Iron Oxide Sputtering Target Specifications

Compound Formula MnFe2O4
Molecular Weight 230.62
Appearance Black Target
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Manganese-Iron Oxide Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Manganese-Iron Oxide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Manganese-Iron Oxide Sputtering Target Application

  1. Semiconductor Manufacturing: Manganese-Iron Oxide Sputtering Targets are widely used in the semiconductor industry due to their superior electrical properties and high purity. They are ideal for use in thin film deposition processes to prepare high-performance electronic components.
  2. Optical Coatings: These targets consist of Manganese and Iron Oxides, making them important in the preparation of optical coatings. They provide tunable properties for optical devices and are suitable for various optical applications.
  3. Optical Device Preparation: Due to their special optical properties, Manganese-Iron Oxide Sputtering Targets are widely used in the preparation of optical devices. They can be used to modulate the performance and characteristics of optical devices.
  4. Thin Film Deposition Processes: Due to their excellent chemical stability, these targets are stable in a variety of thin film deposition processes and are used in a variety of industrial applications including coatings, thin film preparation and more.

Manganese-Iron Oxide Sputtering Target Packaging

Our Manganese-Iron Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Manganese-Iron Oxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.