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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0929 Cryolite Sputtering Target, Na3·AlF6

Chemical Formula Na3·AlF6
Catalog No. ST0929
CAS Number 15096-52-3
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

The Cryolite Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is adept at delivering Cryolite Sputtering Targets with both high purity and competitive pricing.


Cryolite Sputtering Target Description

Cryolite Sputtering Target is a material used in the sputtering process for depositing thin films onto substrates. Cryolite is a mineral compound consisting of sodium (Na), aluminum (Al), and fluorine (F) ions. In sputtering, high-energy ions are directed at the cryolite sputtering target, causing atoms or molecules to be ejected from the target surface. These ejected particles then deposit onto a substrate, forming a thin film with properties inherited from the cryolite material.

Related Product: Sodium Fluoride Sputtering Target

Cryolite Sputtering Target Specifications

Compound Formula Na3·AlF6
Molecular Weight 209.94
Appearance Gray target
Melting Point () 950-1012
Density (g/cm3) 2.9-3.0
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Cryolite Sputtering Target Handling Notes

  1. Indium bonding is recommended for Cryolite Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Cryolite Sputtering Target Application

  • Optical Coatings: Cryolite thin films can be used in optical coatings for various applications, such as anti-reflective coatings and interference filters.
  • Semiconductor Manufacturing: Cryolite coatings may find applications in the semiconductor industry, particularly in the fabrication of electronic and optoelectronic devices.
  • Research and Development: Cryolite thin films may be used in research and development for specific applications where the properties of cryolite are desirable.

Cryolite Sputtering Target Packaging

Our Cryolite Sputtering Target is widely used in the production of coatings for various purposes, such as improving the wear resistance of tools, enhancing the durability of surfaces, or providing specific optical or electrical properties.

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SAM’s Cryolite Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

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Cryolite Sputtering Target, Na3·AlF6
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