(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0516 Thorium Oxide (ThO2) Sputtering Target

Chemical Formula: ThO2
Catalog Number: ST0516
CAS Number: 1314-20-1
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made


Description of Thorium Oxide Sputtering Target


Thorium is a chemical element originated from Thor, the Scandinavian god of thunder. It was first mentioned in 1829 and observed by J. Berzelius. “Th” is the canonical chemical symbol of thorium. Its atomic number in the periodic table of elements is 90 with location at Period 7 and Group 3, belonging to the f-block. The relative atomic mass of thorium is 232.03806(2) Dalton, the number in the brackets indicating the uncertainty.

Specifications of Thorium Oxide Sputtering Target

Material Type Thorium Oxide
Symbol ThO2
Color/Appearance White Solid
Melting Point  3,390° C
Density 10 g/cm3
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.


Our thorium oxide sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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SAM’s thorium trioxide sputter targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

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Thorium Oxide (ThO2) Sputtering Target
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 1 reviews
by Camila West on Thorium Oxide (ThO2) Sputtering Target

I got many sputter targets for our chemistry lab and we use them for sputter deposition experiments.