(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0445 Lanthanum Gallate Sputtering Target, LaGaO3

Chemical Formula: LaGaO3
Catalog Number: ST0445
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Lanthanum gallate sputtering targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.


Lanthanum Gallate Sputtering Target Description

The lanthanum gallate sputtering target is composed of lanthanum, gallium, and oxygen with the chemical formula LaGaO3. High-purity LaGaO3 sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.


Related products: Lanthanum Sputtering TargetGallium Sputtering Target, Oxide Ceramic Sputtering Target

Lanthanum Gallate Sputtering Target Specification

Material Type Lanthanum Gallate
Symbol LaGaO3
Color/Appearance Solid
Melting Point N/A
Density 6.93 g/cm3
Type of Bond Elastomer, Indium
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Other sizes are also available. Please contact us for customized sputtering targets.

Lanthanum Gallate Sputtering Target Application

The lanthanum gallate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Lanthanum Gallate Sputtering Target Packaging

Our lanthanum gallate sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Get Contact

We specialize in producing high-purity lanthanum gallate sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

Submit your review

Create your own review

Lanthanum Gallate Sputtering Target, LaGaO3
Average rating:  
 1 reviews
by Sean Gifford on Lanthanum Gallate Sputtering Target, LaGaO3

Use these regularly in the lab. They work well and never had a defective piece. Great price, shipping is fast.