(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0896 Lanthanum Strontium Manganate Sputtering Target, La0.7Sr0.3MnO3

Chemical Formula La0.7Sr0.3MnO3
Catalog No. ST0896
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

The Lanthanum Strontium Manganate Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality Lanthanum Strontium Manganate Sputtering Target at the most competitive prices.




Description

Lanthanum Strontium Manganate Sputtering Target Description

Lanthanum Strontium Manganate Sputtering Target is specifically composed of lanthanum, strontium, and manganese atoms. It is commonly used in the production of thin films for various applications, including magnetic storage devices, electronic devices, and thin film solar cells.

Lanthanum Strontium Manganate (La0.7 Sr0.3MnO3) Sputtering Target is a material that is used in the process of sputtering. Sputtering is a vapor deposition technique used to deposit thin films of various materials onto a substrate surface. In this process, high-energy ions are bombarded onto a target material, causing atoms from the target to be sputtered or ejected. These sputtered atoms then condense and form a thin film on the substrate.

Lanthanum Strontium Manganate Sputtering Target Specifications

Compound Formula La0.7Sr0.3MnO3
Appearance Dark gray target
Density 6.5 g/cm3
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Lanthanum Strontium Manganate Sputtering Target Handling Notes

  1. Indium bonding is recommended for Lanthanum Strontium Manganate Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity, and is susceptible to thermal shock.

Lanthanum Strontium Manganate Sputtering Target Application

Lanthanum Strontium Manganate Sputtering Target is commonly used in the production of thin films for various applications, including magnetic storage devices, electronic devices, and thin film solar cells.

Lanthanum Strontium Manganate Sputtering Target Packaging

Our Lanthanum Strontium Manganate Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.

Get Contact

SAM’s Lanthanum Strontium Manganate Sputtering Targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

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Lanthanum Strontium Manganate Sputtering Target, La0.7Sr0.3MnO3
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