| Chemical Formula | Fe/Ga |
| Catalog No. | ST0891 |
| CAS Number | 37245-77-5 |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Iron Gallium Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality Iron Gallium Sputtering Target at the most competitive prices.
Iron Gallium Sputtering Target is a specialized material used in the process of sputtering, which is a method commonly used in thin-film deposition. It consists of a high-purity mixture of iron and gallium.
Iron Gallium Sputtering Target is specifically used in applications where a thin film of iron-gallium alloy is required. This alloy exhibits magnetic properties, making it ideal for applications in the field of magneto-electronics, such as magnetic sensors, magnets, data storage devices, and spintronics.
| Compound Formula | Fe/Ga |
| Appearance | Gray metallic target |
| Molecular Weight | 140.773 |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Iron Gallium Sputtering Target is specifically used in applications where a thin film of iron-gallium alloy is required. This alloy exhibits magnetic properties, making it ideal for applications in the field of magneto-electronics, such as magnetic sensors, magnets, data storage devices, and spintronics.
Our Iron Gallium Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Iron Gallium Sputtering Targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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