(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0511 Tungsten Titanium Sputtering Target, W/Ti

Chemical Formula: W/Ti
Catalog Number: ST0511
Purity: 99%~99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

SAM’s Tungsten Titanium Sputtering Targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.


Tungsten Titanium Sputtering Target Description

Delve into the exceptional properties of Tungsten Titanium Sputtering Targets and discover their wide-ranging applications across various industries. This page showcases the distinctive qualities of both Tungsten and Titanium integration in thin film deposition processes, illuminating a path to innovative solutions.

Tungsten: The Resilient Rare Metal

Tungsten, a rare metal, naturally occurs on Earth in compounds with other elements. It claims the title of having the highest melting point among all elements at 3422 °C, alongside the highest boiling point at 5930 °C. While polycrystalline tungsten exhibits brittleness and hardness, pure single-crystalline tungsten is more ductile and can be cut with precision.

Titanium: A Spectrum of Excellence

Titanium, with its lustrous transition metal properties, dons a silver hue, low density, and formidable strength. It resists corrosion in seawater, aqua regia, and chlorine, contributing to its exceptional versatility. Titanium sputtering targets take center stage in applications ranging from CD-ROMs and decorative pieces to flat panel displays and optical communication.

Tungsten Titanium Sputtering Target Specifications

Specification Details
Material Type Tungsten Titanium
Symbol W/Ti
Color/Appearance Solid
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″. Thick: 0.125″, 0.250″. Custom shapes and sizes available on inquiry.
Packing Targets are tagged and labeled externally for identification and quality control. Careful handling during storage and transportation.

Tungsten Titanium Sputtering Target Applications

  1. Elevated Thin Film Deposition: Tungsten Titanium sputtering targets drive the creation of advanced thin films for various applications, ensuring precision and excellence.
  2. Strength in Diversity: The inclusion of Tungsten and Titanium enhances the material’s strength and versatility, fostering innovation.
  3. Advancing Industries: From semiconductor to optical applications, the integration of these elements fuels progress across industries.

Tungsten Titanium Sputtering Target Advantages

  • Exceptional Resilience: The exceptional melting and boiling points of Tungsten alongside Titanium’s resilience amplify the durability of thin film depositions.
  • Diverse Applications: The versatility of Tungsten Titanium sputtering targets spans applications ranging from precision cutting to optical communication.
  • Innovation Catalyst: Integrating these elements ignites innovation in cutting-edge technologies across diverse sectors.

Unleash the potential of Tungsten Titanium Sputtering Targets and harness their remarkable properties for revolutionary applications. Contact us now to explore customized solutions that propel your innovation journey forward.

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Tungsten Titanium Sputtering Target, W/Ti
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 1 reviews
by Aline Barreto on Tungsten Titanium Sputtering Target, W/Ti

Hard to give these a bad a rating, exactly what I was looking for.