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What is the preferred technique for deposition of metal oxide materials?

The preferred deposition methods are: RF sputtering, e-beam evaporation, or reactive pulse DC sputtering of the metal. Consult the SAM deposition table for information specific to a given material.

About the author

Julissa Green graduated from the University of Texas studying applied chemistry. She started her journalism life as a chemistry specialist in Stanford Advanced Materials (SAM) since 2016 and she has been fascinated by this fast growing industry ever since. If you have any particular topics of interest, or you have any questions, you can reach her at julissa@samaterials.com.