(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0998 Nickel Cobalt Sputtering Target, Ni-Co

Chemical Formula Ni-Co
Catalog No. ST0998
CAS Number
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

With a wealth of expertise in materials science, Stanford Advanced Materials (SAM) introduces Nickel Cobalt Sputtering Targets known for their remarkable purity. Our dedication is reflected in offering cost-effective rates and personalized solutions that cater to the precise demands of nanotechnology and thin-film deposition.


Nickel Cobalt Sputtering Target Description

Nickel Cobalt Sputtering Targets possess distinctive properties that make them highly valuable in various technological applications. Known for their exceptional purity, these targets are crucial for precise thin-film deposition processes. The Nickel Cobalt composition ensures superior conductivity, making them ideal for advanced electronic and semiconductor manufacturing. Additionally, these targets exhibit excellent corrosion resistance, enhancing their durability and reliability in demanding environments. Their unique combination of properties makes Nickel Cobalt Sputtering Targets indispensable for cutting-edge nanotechnology applications, providing a foundation for the development of efficient and reliable electronic devices and semiconductor components.

Related Product: Aluminum Nickel Sputtering Target, Chromium Nickel Sputtering Target

Nickel Cobalt Sputtering Target Specifications

Compound Formula Ni-Co
Appearance Silver Metallic Target
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Nickel Cobalt Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Nickel Cobalt Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Nickel Cobalt Sputtering Target Application

Nickel Cobalt Sputtering Targets find diverse applications across advanced technologies. Primarily employed in thin-film deposition processes, these targets play a pivotal role in the production of electronic devices and semiconductor components. The exceptional purity of Nickel Cobalt ensures precise and efficient coating, making it vital in nanotechnology applications. Due to their superior conductivity, these targets are utilized in the manufacturing of high-performance electronic circuits and thin films. Their corrosion resistance further extends their utility in creating durable and reliable coatings. Overall, Nickel Cobalt Sputtering Targets serve as essential materials for enhancing the functionality and performance of various electronic and semiconductor devices.

Nickel Cobalt Sputtering Target Packaging

Our Nickel Cobalt Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Nickel Cobalt Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.