ST0990 Strontium Cobalt Oxide Sputtering Target, SrCoO3

Strontium Cobalt Oxide Sputtering Target Description

Strontium Cobalt Oxide Sputtering Target has the properties of high purity, high density, high sputtering rate and low resistivity. It has good chemical stability and high-temperature oxidation resistance and can be used at higher temperatures and in vacuum environments. In addition, Strontium Cobalt Oxide Sputtering Targets have excellent physical and electrical properties and are widely used in electronics, communications, energy, environmental protection and other fields. When preparing Strontium Cobalt Oxide Sputtering Targets, the purity of raw materials, preparation process parameters and sintering conditions need to be strictly controlled to ensure that high-quality targets are obtained.

Related Product: Strontium Sputtering Target, Strontium Oxide Sputtering Target

Strontium Cobalt Oxide Sputtering Target Specifications

Strontium Cobalt Oxide Sputtering Target Handling Notes

1. Indium bonding is recommended for the Strontium Cobalt Oxide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Strontium Cobalt Oxide Sputtering Target Application

1. Electronics and information industry: In integrated circuits, information storage, liquid crystal display, laser memory, electronic control devices and other fields, Strontium Cobalt Oxide Sputtering Targets can be used to prepare various types of thin film materials. For example, in integrated circuits, sputtering targets can be used to prepare electrical interconnection line film, barrier layer film, etc.
2. Flat panel display industry: The flat panel display industry includes liquid crystal displays (LCD), plasma displays (PDP), field luminescent displays (E-L), field emission displays (FED), and so on. In these fields, Strontium Cobalt Oxide Sputtering Targets can be used to prepare a variety of functional films, such as dielectric layers, conductive films, and barrier films.
3. Wear-resistant materials and high-temperature corrosion-resistant fields: Because Strontium Cobalt Oxide Sputtering Targets have excellent physical and chemical properties, they can also be used in wear-resistant materials and high-temperature corrosion-resistant fields. For example, in the manufacture of engine parts, thermal energy equipment, and other fields, wear-resistant coatings and corrosion-resistant coatings prepared by Strontium Cobalt Oxide Sputtering Targets can be applied.
4. Optical field: In the optical field, the Strontium Cobalt Oxide Sputtering Target can be used to prepare various optical films, such as transmittance enhancement film, reflective film, and filter. These optical films have a wide range of applications in optical instruments, photographic equipment, lighting equipment, and other fields.
5. Solar cell field: In the field of solar cells, Strontium Cobalt Oxide Sputtering Targets can be used to prepare components such as electrodes and mirrors for solar cells. By sputtering SrCoO3 films, the light absorption efficiency and photoelectric conversion efficiency of solar cells can be improved.

Strontium Cobalt Oxide Sputtering Target Packaging

Our Strontium Cobalt Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Strontium Cobalt Oxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.