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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0985 Molybdenum Silicon Sputtering Target, MoSi

Chemical Formula MoSi
Catalog No. ST0985
CAS Number
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Specializing in Molybdenum Silicon Sputtering Targets, Stanford Advanced Materials (SAM) is dedicated to delivering superior quality with a strong emphasis on cost-effectiveness. SAM’s commitment to unparalleled quality ensures that clients receive optimal sputtering targets without compromising affordability, making them the preferred choice in the market.


Molybdenum Silicon Sputtering Target Description

Molybdenum Silicon Sputtering Targets have several unique properties that make them attractive for high-tech applications. Its excellent electrical conductivity makes it ideal for electronic device manufacturing, providing outstanding performance in semiconductor devices. In addition, Molybdenum Silicon Sputtering Targets also have excellent thermal stability and can maintain stability in high-temperature environments, providing reliable support for manufacturing electronic devices.

In the field of optoelectronics, Molybdenum Silicon Sputtering Targets excel, and their special optical properties make them ideal materials for laser devices and photodetectors. Its chemical stability also enables it to maintain excellent performance in complex manufacturing environments, providing reliable basic materials for high-tech industries.

Related Product: Aluminum Silicon Copper Sputtering Target, Aluminum Silicon Sputtering Target

Molybdenum Silicon Sputtering Target Specifications

Compound Formula MoSi
Molecular Weight 124.035
Appearance Silver Metallic Target
Melting Point 2077 °C
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Molybdenum Silicon Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Molybdenum Silicon Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Molybdenum Silicon Sputtering Target Application

Molybdenum Silicon Sputtering Targets are widely used in various fields, and their versatility can make them an important part of high-tech manufacturing. In terms of electronic device manufacturing, Molybdenum Silicon Sputtering Targets are favored for their excellent conductivity and are widely used in the manufacturing of high-performance electronic equipment such as semiconductor devices, transistors, and integrated circuits. In the field of optoelectronics, the optical properties of Molybdenum Silicon Sputtering Targets make it an ideal material for laser devices and photodetectors, providing key support for the development of laser technology and optical communications. In addition, Molybdenum Silicon Sputtering Targets also play a role in solar cell manufacturing, improving solar energy conversion efficiency by taking full advantage of their electrical and optical properties.

Molybdenum Silicon Sputtering Target Packaging

Our Molybdenum Silicon Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Molybdenum Silicon Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.