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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0981 Potassium Tantalate Sputtering Target, KTaO3

Chemical Formula KTaO3
Catalog No. ST0981
CAS Number 12030-91-0
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Stanford Advanced Materials (SAM) is dedicated to delivering Potassium Tantalate Sputtering Targets with a strong emphasis on superior quality and cost-effectiveness. Our competitive pricing makes these sputtering targets an optimal choice for a wide range of high-tech applications, ensuring that clients receive top-tier quality without compromising affordability.


Potassium Tantalate Sputtering Target Description

Primarily utilized in thin film deposition technology, Potassium Tantalate Sputtering Targets play a pivotal role in diverse areas. They find application in crafting optical coatings, facilitating electronic device preparation, and contributing to cutting-edge research in electronics and optics.

Potassium tantalate (KTaO3) acts as a key ferroelectric material with ferroelectric, optical, and electro-optic properties alongside piezoelectricity. It finds wide application in electronics, optics, optoelectronics, and acoustic devices.

Related Product: Potassium Niobate Sputtering Target, Potassium Tantalate Crystal Substrates

Potassium Tantalate Sputtering Target Specifications

Compound Formula KTaO3
CAS No. 12030-91-0
Appearance White Target
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Potassium Tantalate Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Potassium Tantalate Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Potassium Tantalate Sputtering Target Application

The utilization of Potassium Tantalate Sputtering Targets extends across a myriad of applications within thin film deposition technology, showcasing its versatility and impact. In the realm of optical coatings, these sputtering targets play a pivotal role in crafting coatings that enhance light manipulation and transmission, contributing to advancements in optics. Electronic device preparation benefits significantly from the application of these targets, ensuring the production of high-performance components critical for modern electronics. Moreover, in various research fields within electronics and optics, Potassium Tantalate Sputtering Targets serve as fundamental tools.

Potassium Tantalate Sputtering Target Packaging

Our Potassium Tantalate Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Potassium Tantalate Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.