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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0979 Manganese Germanium Sputtering Target, MnGe

Chemical Formula MnGe
Catalog No. ST0979
CAS Number
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Stanford Advanced Materials (SAM) offers Manganese Germanium Sputtering Targets of superior quality and cost-effectiveness. Recognized for excellence, our targets not only meet industry standards but also provide a dependable solution for thin film deposition. SAM’s competitive pricing makes these sputtering targets an optimal choice for a wide range of high-tech applications.

SKU: ST0979 Categories: , Tags: ,


Manganese Germanium Sputtering Target Description

Manganese Germanium Sputtering Targets distinguish themselves in the semiconductor and electronics sectors, excelling with outstanding electrical properties that render them ideal for thin film deposition processes. Comprising a manganese and germanium alloy, these targets exhibit excellent chemical stability, ensuring steadfastness during film preparation. The distinctive alloy combination of manganese and germanium empowers Manganese Germanium Sputtering Targets with tunable physical properties, offering adaptability in thin film deposition for diverse application requirements. This unique set of properties positions these targets as critical materials, contributing to advancements in thin film deposition and related applications across various high-tech industries.

Related Product: Manganese Sputtering Target, Manganese Oxide Sputtering Target

Manganese Germanium Sputtering Target Specifications

Compound Formula MnGe
Appearance Grey Target
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Manganese Germanium Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Manganese Germanium Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Manganese Germanium Sputtering Target Application

  1. Semiconductor Manufacturing: Manganese Germanium Sputtering Targets play a key role in the semiconductor industry for thin film deposition, providing superior electrical performance support for the preparation of electronic components and integrated circuits.
  2. Optical coatings: Due to their excellent physical properties, Manganese Germanium Sputtering Targets are widely used in optical coating preparation to produce films with special optical properties, such as filters and lenses.
  3. Magnetic thin film preparation: The alloy combination of manganese and germanium makes these targets excellent in preparing magnetic thin films for applications in magnetic storage, sensors and magnetic devices.
  4. Electronic device manufacturing: Manganese Germanium Sputtering Targets are widely used in the manufacturing of electronic devices for the preparation of thin films to improve the performance and stability of electronic components.

Manganese Germanium Sputtering Target Packaging

Our Manganese Germanium Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Manganese Germanium Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.