(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0976 Aluminum Manganese Sputtering Target, Al/Mn

Chemical Formula Al/Mn
Catalog No. ST0976
CAS Number
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Renowned for their exceptional purity and competitive pricing, the Aluminum Manganese Sputtering Targets offered by Stanford Advanced Materials (SAM) exemplify excellence. Drawing upon our deep expertise in materials science, we ensure outstanding performance and reliability through the precise craftsmanship applied in the production of these targets.


Aluminum Manganese Sputtering Target Description

Aluminum Manganese Sputtering Targets have some remarkable properties that allow them to excel in applications such as thin film deposition. Outstanding properties include excellent purity, ensuring reliability and a high degree of purity in the preparation of thin films. At the same time, Aluminum Manganese Sputtering Targets offer good electrical properties, making them ideal for use in areas such as the semiconductor industry. The complex combination of alloys also gives these targets superior chemical stability, allowing them to maintain excellent stability during thin film deposition. This combination of properties makes Aluminum Manganese Sputtering Targets widely used in a variety of high-tech industries, supporting the development of advanced technologies and industrial applications.

Related Product: Manganese Sputtering Target, Manganese Oxide Sputtering Target

Aluminum Manganese Sputtering Target Specifications

Compound Formula Al/Mn
Appearance Silver Metallic Target
Density 2.72g/cm3
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Aluminum Manganese Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Aluminum Manganese Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Aluminum Manganese Sputtering Target Application

  1. Semiconductor Industry: Due to their good electrical properties, Aluminum Manganese Sputtering Targets are widely used in the semiconductor industry for thin film deposition to prepare high-performance films for electronic components and integrated circuits.
  2. Optical Coatings: These targets play a key role in the preparation of optical coatings, which are used to prepare thin films with special optical properties for a wide range of optical devices and applications, such as lenses and filters.
  3. Magnetic Sensors: Thin films of Aluminum Manganese may be used in the manufacturing of magnetic sensors and devices, contributing to advancements in sensing technologies.
  4. Electronics: In the manufacture of electronic devices, these targets are used to prepare thin films to improve the performance and stability of electronic components to support various electronic applications.

Aluminum Manganese Sputtering Target Packaging

Our Aluminum Manganese Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Aluminum Manganese Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.