(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0963 Gallium Antimonide Sputtering Target, GaSb

Chemical Formula GaSb
Catalog No. ST0963
CAS Number 12064-03-8
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Stanford Advanced Materials (SAM) provides a range of Platinum Gallium Antimonide Sputtering Targets in different forms, purities, sizes, and prices. Explore the fusion of precision and reliability with Gallium Antimonide with SAM. If you require further information or have specific inquiries, feel free to contact us.


Gallium Antimonide Sputtering Target Description

Gallium Antimonide Sputtering Target is a specialized material used in the sputtering process for thin film deposition. In sputtering, high-energy ions are directed at a target material, causing atoms to be ejected from the target surface. These ejected atoms then deposit onto a substrate, forming a thin film with specific properties.

Gallium Antimonide (GaSb) emerges as a versatile semiconductor material, showcasing adjustable conductivity across diverse temperature gradients, thereby proving its suitability for the intricate fabrication of electronic devices. The extraordinary optical properties of Gallium Antimonide contribute to its significance, featuring a bandgap of approximately 0.72 electron volts (eV). This characteristic renders Gallium Antimonide well-matched for the development of sophisticated infrared optics devices and detectors, where precision and sensitivity are paramount. Beyond its electronic and optical prowess, Gallium Antimonide maintains a profile of stable thermal properties across varying temperature ranges. This unique attribute positions Gallium Antimonide as an optimal choice for applications in high-temperature environments, ensuring reliability and performance consistency.

Related Product: Gallium (III) Selenide Sputtering Target, CIGS Copper Indium Gallium Antimonide Sputtering Target

Gallium Antimonide Sputtering Target Specifications

Compound Formula GaSb
Molecular Weight 191.48
Appearance Gray Target
Melting Point
Density 5.62 g/cm3
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Gallium Antimonide Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Gallium Antimonide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Gallium Antimonide Sputtering Target Application

  1. Infrared Optics: Gallium Antimonide is widely used in the preparation of infrared optics devices, such as infrared sensors, detectors, and infrared lasers, due to its unique optical properties, especially in the infrared band.
  2. Electronics: As a semiconductor material, Gallium Antimonide has a wide range of applications in electronics, including field effect transistors (FETs), photodiodes (LEDs), and photodetectors.
  3. High-Temperature Applications: Gallium Antimonide exhibits excellent and stable thermal properties, making it ideal for high-temperature environments and applications in aerospace, energy, and other high-temperature processes.
  4. Semiconductor Technology: Because of its semiconductor properties, Gallium Antimonide plays a key role in semiconductor technology, supporting the development of integrated circuits and other semiconductor devices.

Gallium Antimonide Sputtering Target Packaging

Our Gallium Antimonide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

Get Contact

SAM’s Gallium Antimonide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.