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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0942 Lead Antimonide Sputtering Target, PbSb

Chemical Formula PbSb
Catalog No. ST0942
CAS Number 12266-38-5
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

The Lead Antimonide Sputtering Target is available in various forms, purities, sizes, and prices. The team of Stanford Advanced Materials (SAM) works to provide you with the highest quality Lead Antimonide Sputtering Targets at competitive prices to support your production research.


Lead Antimonide Sputtering Target Description

Lead Antimonide Sputtering Targets exhibit high purity and low impurity content, ensuring favorable electrical and optical properties. Their remarkable electrical conductivity makes them extensively utilized in the electronics and electric power sectors. With stable physical and chemical properties, Lead Antimonide Sputtering Targets uphold performance stability even in challenging environments. Additionally, their high thermal conductivity facilitates efficient heat transfer, rendering them valuable for applications in heat dissipation and thermal conductivity. Owing to these exceptional characteristics, Lead Antimonide Sputtering Targets find diverse applications such as solar cells, electronic devices, and various other fields.

Related Product: Lead Sulfide Sputtering Target, Lead Sulfide Sputtering Target

Lead Antimonide Sputtering Target Specifications

Compound Formula PbSb
Molecular Weight 328.94
Appearance Dark Grey Target
Melting Point
Density 6.72
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Lead Antimonide Sputtering Target Handling Notes

  1. Indium bonding is recommended for Lead Antimonide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Lead Antimonide Sputtering Target Application

Due to its unique properties and excellent quality, Lead Antimonide Sputtering Targets can be used in many fields. As a semiconductor, it can be used in the preparation of related devices, such as photodiodes (photovoltaic diodes), as well as in the preparation of electronic devices. Lead Antimonide Sputtering Targets can also be used in the field of photovoltaics and thermoelectrics, such as thin film deposition, conductive films, transparent conductive films, and so on.

Lead Antimonide Sputtering Target Packaging

Our Lead Antimonide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Lead Antimonide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

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Lead Antimonide Sputtering Target, PbSb
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