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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0927 Potassium Fluoride Sputtering Target, KF

Chemical Formula KF
Catalog No. ST0927
CAS Number 7789-23-3
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

The Potassium Fluoride Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers Potassium Fluoride Sputtering Targets renowned for exceptional quality, all at highly competitive prices.


Potassium Fluoride Sputtering Target Description

Potassium Fluoride Sputtering Target is used in a process called sputtering, which is a technique for depositing thin films onto a substrate. Sputtering targets come in various shapes and sizes, depending on the specific requirements of the thin film deposition process and the equipment used.

In the context of sputtering, a high-energy ion beam bombards the surface of the potassium fluoride sputtering target, causing atoms or molecules to be ejected. These ejected particles then deposit onto a substrate, forming a thin film with properties inherited from the target material.

Related Product: Potassium Sputtering Target

Potassium Fluoride Sputtering Target Specifications

Compound Formula KF
Molecular Weight 58.10
Appearance Gray target
Melting Point () 858
Density (g/cm3) 2.48
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Potassium Fluoride Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Potassium Fluoride Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Potassium Fluoride Sputtering Target Application

  • Optical Coatings: Potassium fluoride thin films are used in optics for anti-reflective coatings and interference filters.
  • Semiconductor Manufacturing: the fabrication of integrated circuits.
  • Research and Development: Potassium fluoride coatings may be utilized in various research and development applications.

Potassium Fluoride Sputtering Target Packaging

Our Potassium Fluoride Sputtering Target is widely used in the production of coatings for various purposes, such as improving the wear resistance of tools, enhancing the durability of surfaces, or providing specific optical or electrical properties.

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SAM’s Potassium Fluoride Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

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