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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0898 Permalloy (Ni/Fe/Mo/Mn) Sputtering Target

Chemical Formula Ni/Fe/Mo/Mn
Catalog No. ST0898
CAS Number 12035-04-0
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

The Permalloy (Ni/Fe/Mo/Mn) Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality Permalloy (Ni/Fe/Mo/Mn) Sputtering Target at the most competitive prices.


Permalloy (Ni/Fe/Mo/Mn) Sputtering Target Description

Permalloy (Ni/Fe/Mo/Mn) Sputtering Target refers to a material that is used in a process called sputtering. Sputtering is a technique used in the deposition of thin films onto a substrate. In this process, ions are bombarded onto a target material, causing the atoms from the target material to be ejected and deposited onto the substrate. By using a Permalloy sputtering target, thin films of Permalloy can be deposited onto a substrate to create magnetic components or enhance the magnetic properties of a device.

Permalloy is a type of magnetic material that is commonly used in various electronic devices and applications. It is made up of a combination of nickel (Ni), iron (Fe), molybdenum (Mo), and manganese (Mn) elements. These elements are mixed together in specific proportions to achieve the desired magnetic and electrical properties.

Permalloy (Ni/Fe/Mo/Mn) Sputtering Target Specifications

Compound Formula Ni/Fe/Mo/Mn
Appearance gray metallic target
Melting Point () 1395
Density 8.7 g/cm3
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Permalloy (Ni/Fe/Mo/Mn) Sputtering Target Handling Notes

  1. Indium bonding is recommended for Permalloy (Ni/Fe/Mo/Mn) Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity, and is susceptible to thermal shock.

Permalloy (Ni/Fe/Mo/Mn) Sputtering Target Application

Permalloy (Ni/Fe/Mo/Mn) Sputtering Target is widely used in the manufacturing of magnetic sensors, magnetic recording heads, magnetic shielding, and other magnetic devices.

Permalloy (Ni/Fe/Mo/Mn) Sputtering Target Packaging

Our Permalloy (Ni/Fe/Mo/Mn) Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.

Get Contact

SAM’s Permalloy (Ni/Fe/Mo/Mn) Sputtering Targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

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